Electric Arc Lamps TRIZ Cases
- Arc Lamp Water-Loop Nitrogen Injection for Deposit Control
Nitrogen injection into the arc lamp water loop controls pH, suppresses oxide deposits, and preserves light output in millisecond anneal systems.
- Variable-Length Integer Encoding With Adaptive Gamma1 Tags
Adaptive Gamma1 coding sets a threshold K from integer sizes to shorten tags, improving compression and storage efficiency over Elias gamma code.
- Hall Thruster Shared Magnetic Circuit Structure
Shared magnetic circuits reduce weight and complexity in multi-thruster spacecraft arrays by consolidating field sources.
- Aluminum Arc Ion Source with Temperature Control
An aluminum arc ion source maintains precise chamber temperatures through integrated sensor feedback.
- Smart Flashlight Control for Mobile Photography Lighting
Mobile terminal detects ambient light to activate fill light, adjusting intensity by subject type to prevent eye strain and improve photo quality.
- Gallium Ion Source Using Compound Targets and Reactive Etchants
A gallium ion source employs a solid compound target and gaseous etchant to generate volatile species for stable beam production.
- Temperature Controlled Dielectric Window for Plasma Chamber
Independent temperature zones reduce thermal stress and improve plasma processing efficiency.
- Ion Source Extraction Plate Biasing for Plasma Density
Electrically isolating the extraction plate allows independent voltage biasing to boost plasma density and reduce electron losses at the aperture.
- Ion-Bombardment Electron Source Power Supply with Pulse Sequencing
A power supply device generates positive and negative voltage pulses to drive an ion-bombardment electron source.
- Helicon Plasma Source Uniformity via Dual Sources and Diffusion Chamber
Dual helicon plasma sources feed a diffusion chamber to resolve non-uniform plasma density, enabling high beam currents for single-pass solar cell doping.
- Non-Uniform Coaxial Waveguide for Plasma Processing
Varying the thickness ratio of the coaxial waveguide conductors along its length reduces microwave reflection and enables stable large power transmission.
- Atmospheric Plasma Jet With Inclined Nozzles For Wide Area Processing
Inclined plasma nozzles eject beams obliquely to expand the processing area, while gas circulation dissipates heat from the housing.
- Coaxial Electrode Plasma Light Source for EUV Generation
Inverted polarity discharge between coaxial electrodes confines plasma axially, reducing heat load while sustaining high EUV output.
- Thermionic Diode Current Limiter for Ion Implantation Arc Protection
A thermionic diode assembly limits current flow in high voltage power supplies.
- Hall Thruster Power Supply Oscillation Suppression
A Hall thruster power supply regulates anode voltage, gas flow rate, and coil current to stabilize ion acceleration.
- Integrated Anode Inner Pole Closed Drift Ion Source
Closed drift ion source with integrated anode and inner magnetic pole.
- Switch Device Non-Linear Transmission Line Jitter Reduction
Trigger electrode creates plasma to lower main gap breakdown voltage, reducing switch-to-switch jitter from dielectric thickness variations.
- Ion Source Arc Chamber with Redundant Cathodes
A redundant cathode system in an ion source arc chamber enables seamless switching between electrodes to maintain continuous operation.
- Electron Cyclotron Resonance Ion Generator Segmentation
An electron cyclotron resonance ion generator segments the vacuum chamber into distinct ionization and confinement zones to maintain continuous plasma.
- Ion Beam Extraction via Curved Potential Distribution
A biased electrode with a customized conductor-insulator interface creates a strongly curved potential distribution to focus extracted ions.