Ion Beam Extraction via Curved Potential Distribution
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Solution Overview
Problem
Existing ion beam extraction technologies face challenges in achieving high current density and efficient focusing, particularly for large area treatment and heat-sensitive materials, with conventional systems being complex and inefficient in generating high current density ion beams for applications like semiconductor manufacturing and nanostructuring.
Innovation Solution
The use of a biased electrode with a customized conductor-insulator interface to create a strongly curved potential distribution in the plasma sheath, acting as an electrostatic lens for discrete ion focusing, which concentrates the ion flux onto a specific area on the electrode surface, thereby forming a high current density ion beam.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If conventional ion beam extraction mechanisms are used, then ion beam can be extracted from plasma source, but the current density of the ion beam is low
Solution Approach 1:
The patent changes the geometric parameters of the extraction electrode (curvature radius, opening size, position) to optimize the plasma sheath structure and ion extraction efficiency, thereby increasing ion beam current density without requiring proportional increases in plasma power
Solution Approach 2:
The patent creates localized high current density regions by optimizing the extraction electrode geometry to concentrate ion flux in specific areas, enabling high current density ion beams to be extracted from specific zones of the plasma source
2Quantity of substance
If ion beam is subjected to manipulation and conditioning, then desired energy level and deflection are achieved, but current density of the ion beam decreases
Solution Approach 1:
The patent performs ion acceleration and energy selection at the extraction electrode itself, before the ion beam enters the manipulation and conditioning section. This preliminary energy selection prevents additional current density losses that would occur during subsequent manipulation stages
3Quantity of substance
If conventional plasma source configuration is used, then ion generation is achieved, but extraction of high current density ion beam is difficult
Solution Approach 1:
The patent extracts only the essential geometric features needed for high current density extraction from complex plasma source configurations. The extraction electrode with optimized curvature and opening geometry can be applied to various plasma source types without requiring complex modifications to the plasma generation system
Solution Approach 2:
The patent achieves high current density extraction by optimizing key geometric parameters of the extraction electrode (curvature radius R, opening size a, position z) rather than modifying complex plasma source configurations, thereby simplifying the overall device structure
4Area of stationary object
If ion beam treatment is performed on large area materials, then coverage is achieved, but exposure time becomes long and manipulation becomes difficult
Solution Approach 1:
The patent transitions from linear ion beam scanning to area-wide ion flux distribution by optimizing the extraction electrode geometry to produce broad ion flux patterns. This dimensional change from 1D scanning to 2D/3D flux distribution enables simultaneous treatment of large areas without increasing exposure time
5Manufacturing precision
If highly focused ion beam is required for nanostructuring, then resolution is improved, but ion beam current losses increase during trajectory
Solution Approach 1:
The patent performs ion focusing at the extraction electrode by optimizing its geometric parameters (curvature radius, opening size, position) to pre-concentrate ion flux before the beam enters the trajectory section. This preliminary focusing minimizes current losses during transport while maintaining high resolution at the target
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the extraction of ion beams with high current density and large area coverage, reducing complexity and maintaining the initial plasma environment, making it suitable for applications requiring precise ion treatment and high current density, such as semiconductor manufacturing and nanostructuring.
Implementation Method 1
The ion extractor includes a biased electrode forming an interface with an insulator. The interface is customized to form a strongly curved potential distribution in the space charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening on a surface of the biased electrode.
Implementation Method 2
The ion extractor is surrounded by a space charge formed at least in part by the extracted ions. When an electrode is biased, a plasma sheath (space charge) is formed surrounding the electrode.
Implementation Method 3
The strongly curved potential distribution focuses the extracted ions towards an opening on a surface of the biased electrode. The focusing results in an ion beam with high current density.
Data Source
AI summary
An apparatus and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) and an ion extractor. The plasma source is adapted to generate ions and the ion extractor is immersed in the plasma source to extract a fraction of the generated ions. The ion extractor is surrounded by a space charge formed at least in part by the extracted ions. The ion extractor includes a biased electrode forming an interface with an insulator. The interface is customized to form a strongly curved potential distribution in the space-charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening on a surface of the biased electrode thereby resulting in anion beam.