Alicyclic Polymer Composition for ArF Lithography
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Solution Overview
Problem
Current chemically-amplified positive-tone radiation-sensitive resin compositions face challenges in forming high-resolution patterns with ArF excimer lasers due to the large absorbance of aromatic compounds at 193 nm, limiting their use in creating minute patterns.
Innovation Solution
A polymer composition incorporating specific repeating units, an acid generator, and an acid diffusion controller, which includes a polymer with repeating units such as hydroxystyrene and alicyclic hydrocarbon structures, along with an acid generator and an acid diffusion controller, to enhance developability and pattern peeling resistance while minimizing absorbance at 193 nm.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If aromatic compounds such as PHS are used in radiation-sensitive resin composition, then high sensitivity and high resolution patterns can be formed at 248 nm wavelength, but the absorbance becomes too large at 193 nm wavelength making it difficult to use with ArF excimer lasers
Solution Approach 1:
The patent changes the chemical composition parameters of the polymer by introducing specific repeating units with low absorbance at 193 nm (such as alicyclic hydrocarbon groups and specific ester groups) while maintaining appropriate sensitivity through the acid generator system, enabling compatibility with ArF excimer laser lithography
Solution Approach 2:
The patent creates a composite resin composition combining the polymer with specific repeating units, acid generators, and other additives to achieve both low absorbance at 193 nm and sufficient sensitivity for pattern formation, resolving the contradiction between transparency and reactivity
2Strength
If polymer molecular weight is increased to improve pattern peeling resistance, then pattern stability improves, but manufacturing complexity and processing difficulty increase
Solution Approach 1:
The patent optimizes the molecular weight parameter of the polymer to a specific range (weight average molecular weight 10,000-100,000) that provides sufficient pattern peeling resistance while maintaining ease of processing and manufacturing, avoiding the complexities associated with very high molecular weight polymers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer composition improves pattern resolution and peeling resistance, enabling the formation of high-quality patterns with ArF excimer lasers by optimizing the chemical reaction and acid diffusion, thus overcoming the limitations of existing technologies.
Implementation Method 1
a polymer having a poly(hydroxystyrene) (hereinafter referred to from time to time as 'PHS') skeleton having a small absorbance of a light at a wavelength of 248 nm is used
Implementation Method 2
generating an acid when exposed to deep ultraviolet rays having a wavelength of 250 nm or less (e.g. a KrF excimer laser and an ArF excimer laser) or electron beams and causing a solubility rate difference between an exposed area and a non-exposed area in a developing solution by a chemical reaction catalyzed by the acid
Data Source
AI summary
A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000,wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group,wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.