Photosensitive Materials TRIZ Cases
- Imaging Underlayer Polarity Patterning for Block Copolymer Alignment
Acid-diffused underlayers create lithographic polar regions that guide block copolymer domains without separate photolithography.
- Flexible Web Cleaning with Backup Roller and Gas Curtain
High-pressure liquid cleans supported polymer webs while a gas curtain strips residual fluid, improving particle removal without bath or ultrasonic damage.
- Interchangeable Rotary Hand Tool With Adjustable Shroud for Garden Tilling
A reversible rotary shaft and adjustable shroud let one powered hand tool till, brush, clean, and polish while limiting plant damage.
- Rotating Brush Hand-Washing Station for Nail and Crevice Cleaning
Rotating brushes, spray nozzles, and disinfectant improve automated cleaning of fingernails and crevices to reduce debris and infection risk.
- Laser Imaging Coatings With NIR-Activated Diacetylene Stability
NIR-activated diacetylene coatings stay colorless under background radiation, then form precise multicolor images only in exposed areas.
- Vehicle Tracking for Accurate Car Wash Service Matching
Image-based vehicle tracking pairs each car with the right wash selection, reducing queue errors, wait time, and tunnel bottlenecks.
- Photosensitive Polyimide Dry Film for Sub-3 Micron Patterning
A fully imidized polyimide dry film enables sub-3 micron patterning at 5 microns or less while preserving thermal and mechanical performance.
- Photosensitive Polyimide Films for Low-Stress Wafer Patterning
A fully imidized polyimide composition uses solubility switching for fast patterning while reducing shrinkage and residual stress on thinned wafers.
- Photosensitive Resin Composition for Thick-Film Hollow Structures
Acrylate and methacrylate resin chemistry enables thick-film rib and cover patterns with high modulus, moisture resistance, and hollow-structure stability.