Resist Composition with Controlled Acid Decomposable Units
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Solution Overview
Problem
Current resist compositions face challenges in achieving high resolution and reducing defects such as surface abnormalities during the development process, particularly with the increasing demands for pattern miniaturization and improved lithography properties.
Innovation Solution
A resist composition is developed that includes a base component with a structural unit represented by general formula (a0-1) and an acid decomposable group, where the structural unit (a0) is less than 50 mol %, along with a nitrogen-containing solvent for polymerization, to enhance solubility and adhesion, thereby improving lithography properties and reducing defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the proportion of structural units having acid decomposable groups is increased to improve dissolution contrast, then lithography properties are improved, but surface abnormalities and defects increase
Solution Approach 1:
The patent changes the chemical composition parameters of the base resin by precisely controlling the proportion of structural units with acid decomposable groups to be 40-70 mol %. This parameter optimization balances the dissolution contrast needed for lithography with the suppression of surface abnormalities, resolving the contradiction between manufacturing precision and harmful surface effects.
Solution Approach 2:
The patent employs composite resin structures combining multiple structural units including acid decomposable groups, polar groups, and cyclic carbonate groups in specific proportions. This composite approach allows simultaneous achievement of good dissolution contrast and reduced surface abnormalities by leveraging the complementary properties of different structural units.
2Measurement precision
If the proportion of structural units having acid decomposable groups is increased to improve dissolution contrast, then resolution is improved, but defects such as scum and foam increase
Solution Approach 1:
The patent optimizes the concentration parameter of acid decomposable structural units to 40-70 mol %, which is lower than conventional levels. This parameter change maintains sufficient dissolution contrast for high resolution while reducing the generation of harmful defects like scum and foam during the developing process.
Solution Approach 2:
The patent introduces polar groups and cyclic carbonate groups as intermediary structural elements that mediate between the acid decomposable groups and the developing solution. These intermediary units modulate the interaction between acid, resin, and developing solution, reducing defective formations while preserving resolution.
3Ease of manufacture
If conventional resist compositions are used to maintain simplicity, then ease of manufacture is preserved, but lithography properties and resolution are insufficient
Solution Approach 1:
The patent develops a composite base resin system integrating multiple functional structural units (acid decomposable, polar, and cyclic carbonate groups) in optimized proportions. This composite material achieves superior lithography properties and resolution while maintaining reasonable ease of manufacture through systematic composition design.
Solution Approach 2:
The patent systematically optimizes compositional parameters including the proportions of different structural units to achieve the best balance between manufacturing feasibility and lithography performance. The specified ranges (40-70 mol % for acid decomposable groups) provide manufacturable formulation guidelines while delivering enhanced lithography properties.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves excellent resolution and suppresses defects, ensuring high-quality resist patterns with improved lithography properties and shape, while maintaining effective development contrast.
Implementation Method 1
an acid generator component (B) that generates acid upon exposure
Implementation Method 2
a base component (A) that exhibits changed solubility in a developing solution under the action of acid
Data Source
AI summary
A resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1)) containing an acid decomposable group that exhibits increased polarity under action of acid, and the amount of the structural unit (a0) is less than 50 mol %,wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a divalent linking group; R2 represents a —SO2— containing cyclic group; and v represents 0 or 1.