Photosensitive Paste Low Tg Monomer Fine Pattern Formation

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Solution Overview

Problem

Existing techniques for forming fine patterns using photosensitive pastes often result in defects, such as adjacent patterns not being adequately separated, leading to shorts and other flaws, particularly when trying to create finer patterns.

Innovation Solution

A photosensitive paste is developed with a polymerizable monomer having a glass transition temperature of −10° C. or less, which minimizes unnecessary polymerization caused by unintended light exposure, thereby reducing residue and improving pattern formation accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional photosensitive paste is used to form fine patterns, then pattern formation is attempted, but adjacent patterns are not adequately separated causing shorts and defects

Engineering Contradiction:

Improvepattern formation accuracyVSAvoidpattern separation quality

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The patent changes the glass transition temperature parameter of the polymerizable monomer to -10°C or lower. This parameter change reduces unnecessary polymerization during exposure, improving pattern separation and preventing shorts between adjacent patterns while maintaining fine pattern formation capability

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

Instead of trying to prevent polymerization in unexposed areas through exposure control, the invention inverts the approach by using a monomer that remains unpolymerized in unexposed areas due to its low Tg property, and only polymerizes where light exposure occurs, thereby achieving natural pattern separation

Inventive Principle:

Principle #13The other way round (Inversion)

2Productivity

If conventional photosensitive paste is used for fine patterns, then exposure is performed, but unnecessary polymerization occurs causing residue on substrate

Engineering Contradiction:

Improvepattern formation efficiencyVSAvoidresidue amount

Core Design Contradiction:

ProductivityVSLoss of substance

Solution Approach 1:

The patent changes the glass transition temperature parameter of the polymerizable monomer to -10°C or lower. This parameter change ensures that the monomer remains in a flexible, unpolymerized state in unexposed areas, preventing residue formation while maintaining efficient pattern formation in exposed areas

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of a low-Tg monomer in the photosensitive paste effectively reduces residue and defects, enabling the formation of fine patterns with improved separation and reduced product flaws.

Implementation Method 1

exposing the applied paste to light, which initiates the polymerization of the polymerizable monomer

Methodology Applied

Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS7887992B2Photosensitive paste and process for production of pattern using the same

Publication Date: 2011.02.15 MICROMAX (US) HOLDINGS LLC

AI summary

Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.