Fluorinated Silazane Release Agents for Nanoimprint Lithography

The patent applies parameter changes by modifying the chemical composition of the release layer from traditional fluorosilane compounds to fluorinated silazane compounds with specific molecular structures (Formula I). This chemical parameter change results in a release layer that maintains its properties over 100 successive imprints, preventing the degradation that occurs with conventional release agents and thereby extending template lifespan while maintaining reliability.

The patent employs composite materials by creating a release layer composed of fluorinated silazane molecules that combine fluorinated alkyl groups (providing low surface energy and release properties) with silazane backbone structures (providing stability and adhesion). This composite molecular structure achieves both initial separation defect reduction and long-term durability, resolving the contradiction between reliability and template lifespan.

The patent resolves this contradiction through parameter changes in the release layer chemistry. The fluorinated silazane compounds (Formula I) are specifically designed with molecular structures that resist degradation during successive imprints. The fluorinated alkyl chains (R1, R2, R3) provide stable low-surface-energy properties, while the silazane core structure ensures durability, enabling high productivity without increasing separation defect rates.

The patent implements continuity of useful action by ensuring the release layer maintains its separation functionality throughout the entire template lifespan. The fluorinated silazane release layer continuously prevents adhesion between the template and solidified imprint resist across 100+ successive imprints, eliminating the need for template removal and cleaning, thereby maintaining both productivity and reliability throughout extended use.