Alicyclic Resin Composition for ArF Lithography LWR and DOF
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Solution Overview
Problem
Current actinic-ray or radiation-sensitive resin compositions face challenges in achieving excellent line width roughness (LWR), pattern collapse performance, and depth of focus (DOF), particularly in the 45 nm or less line width generation, especially when using ArF excimer lasers, due to limitations in the combination of resins, photoacid generators, additives, and solvents.
Innovation Solution
A radiation-sensitive resin composition comprising a resin with specific repeating units, a compound that decomposes to produce a proton acceptor or acid upon exposure, and an acid generator, optimized to enhance LWR, pattern collapse performance, and DOF, with a composition that includes a hydrophobic resin and specific functional groups to improve solubility and pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional chemical amplification systems with aromatic groups are used for ArF excimer laser (193 nm) exposure, then the system can process a broader range of applications, but the aromatic groups inherently exhibit sharp absorption around 193 nm which deteriorates pattern formation quality and resolving power
Solution Approach 1:
The patent changes the chemical composition parameters of the resin by using alicyclic hydrocarbon structures instead of aromatic groups, and by incorporating specific functional groups (carboxyl, hydroxyl, amino, or cyano groups) to achieve the desired balance between adaptability and pattern formation quality at 193 nm wavelength
Solution Approach 2:
The patent creates a composite resin system combining alicyclic hydrocarbon base structures with specific functional groups that provide both the required chemical reactivity for pattern formation and the optical transparency needed for ArF excimer laser exposure, resolving the contradiction between versatility and precision
2Manufacturing precision
If resist compositions are optimized for 65 nm or less line width formation, then resolving power improves, but it becomes extremely difficult to discover appropriate combinations of resin, photoacid generator, additive and solvent, increasing system complexity
Solution Approach 1:
The patent specifies precise parameter ranges for the functional groups (carboxyl, hydroxyl, amino, or cyano groups) in the alicyclic hydrocarbon resin to achieve optimal resolving power for 65 nm or less line widths while maintaining manageable system complexity through defined compositional parameters
3Manufacturing precision
If resin compositions are modified to improve LWR and pattern collapse performance, then pattern quality improves, but the combination of resin, photoacid generator, additive and solvent becomes more difficult to optimize
Solution Approach 1:
The patent defines specific parameter ranges for functional group content (0.1-10 mmol/g for carboxyl or hydroxyl groups, or 0.1-5 mmol/g for amino or cyano groups) to achieve improved LWR and pattern collapse performance while providing clear guidance for manufacturing optimization
Solution Approach 2:
The patent introduces specific functional groups at localized positions within the alicyclic hydrocarbon resin structure to achieve improved pattern quality characteristics without requiring complete redesign of the entire resin system, thereby easing manufacturing optimization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition significantly enhances LWR, pattern collapse performance, and DOF, enabling the formation of high-quality patterns with improved rectangular configuration and stability, even at smaller line widths.
Implementation Method 1
a compound (PA) containing a functional group with proton acceptor properties and being configured to decompose when exposed to actinic rays or radiation to thereby produce a compound exhibiting lower or no proton acceptor properties or a compound exhibiting acid properties instead of the proton acceptor properties
Implementation Method 2
a compound being configured to generate an acid when exposed to actinic rays or radiation
Implementation Method 3
a resin containing a repeating unit with any of partial structures of general formula (I) below, the resin being configured to increase its rate of dissolution in an alkali developer when acted on by an acid
Data Source
AI summary
Provided is an actinic-ray- or radiation-sensitive resin composition excelling in the LWR, pattern collapse performance and DOF, and a method of forming a pattern using the same. The composition according to the present invention contains (A) a resin containing a repeating unit with any of partial structures of general formula (I) below, (B) a compound (PA) as defined in the specification, and (C) a compound being configured to generate an acid when exposed to actinic rays or radiation, wherein the resin is contained in an amount of 50 mass % or more based on total solids of the composition.