Photo-Taking Processes TRIZ Cases
- Scan Exposure Mask Blind Layout for Diffusive Reflection Control
A light-absorbing member beside the mask blind suppresses edge reflections in scan exposure, reducing photoresist defects and particles.
- Positive Resist Composition with Acid-Decomposable Structures
A positive resist composition uses specific acid-decomposable structures in polymer main and side chains to improve solubility contrast.
- Selective Sub-Resolution Assist Feature Positioning for Interconnect Optimization
A method positions sub-resolution assist features selectively on photomasks to optimize interconnect patterning.