Scan Exposure Mask Blind Layout for Diffusive Reflection Control
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Solution Overview
Problem
Conventional scan type exposure apparatuses suffer from exposure defects due to diffusive reflection at the edge portions of the mask blind, leading to particle generation and quality issues in photoresist patterns.
Innovation Solution
The exposure apparatus incorporates a light-absorbing member with diffusive reflection-preventing parts on its side surfaces, positioned between the optical system and the mask, to prevent diffusive reflections by covering adjacent regions of the mask and ensuring smooth surfaces to minimize light interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a mask blind is used to prevent light interference between alignment key and patterns, then light interference is prevented, but diffusive reflection at the edge portion causes exposure defects and particle generation
Solution Approach 1:
A light-absorbing member is introduced as an intermediary component between the mask blind and the photoresist layer. This member absorbs stray light and prevents diffusive reflection at the edge portions, thereby eliminating exposure defects and particle generation while maintaining the light interference prevention function of the mask blind
Solution Approach 2:
The invention converts the harmful diffusive reflection from the mask blind edge into a beneficial absorption process. By positioning a light-absorbing member at the edge portion, the previously harmful reflected light is now absorbed, transforming the harmful effect into a useful light-blocking function that prevents exposure defects
2Object-affected harmful factors
If the mask blind blocks light for alignment key or patterns, then light interference is prevented, but diffusive reflection occurs at the edge portion
Solution Approach 1:
The light-absorbing member serves as a mediator that intercepts light before it can undergo diffusive reflection at the mask blind edge. This intermediary component ensures that the light-blocking function is maintained while preventing the generation of reflected light that would degrade photoresist pattern quality
3Device complexity
If conventional mask blind design is used, then device structure is simple, but exposure defects occur due to diffusive reflection
Solution Approach 1:
The invention segments the light control function into two separate components: the mask blind for blocking light during alignment, and the light-absorbing member for preventing diffusive reflection. This segmentation allows each component to perform its specific function effectively, improving exposure quality while maintaining overall structural simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces exposure defects by preventing diffusive reflections, thereby enhancing the quality of photoresist patterns and improving the etch mask performance.
Implementation Method 1
a light-absorbing member is disposed between the optical system and the mask
Implementation Method 2
has a diffusive reflection preventing part formed at a side surface of the light-absorbing member
Data Source
AI summary
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first light transmission pattern formed in a first region of the mask body, and a second light transmission pattern formed in a second region of the mask body. The mask is transported in a first direction. The light-absorbing member is disposed between the optical system and the mask, and has a diffusive reflection preventing part formed at a side surface of the light-absorbing member. The substrate plate supports a substrate having a photoresist layer formed thereon. The substrate plate is transported along the first direction together with the mask, thereby preventing a diffusive reflection.