ArF Resin Composition with Lactone Units for Resolution
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Solution Overview
Problem
Current actinic ray-sensitive resin compositions face challenges in achieving high resolution and line edge roughness performance, especially when using ArF excimer lasers, due to issues with pattern variation and development defects, and have difficulties with solubility and affinity for developers.
Innovation Solution
A resin composition incorporating a repeating unit with a lactone structure, capable of increasing solubility in alkali developers, combined with an acid generator, to enhance focus latitude and reduce development defects, while maintaining compatibility with ArF exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a resin with alicyclic hydrocarbon structure is used for ArF excimer laser exposure, then the absorption at 193 nm is reduced, but the line edge roughness performance and resolution deteriorate
Solution Approach 1:
The patent uses a composite resin structure combining alicyclic hydrocarbon main chains with specific side groups (cyano, carboxyl, or hydroxyl groups) to achieve both low absorption at 193 nm and improved line edge roughness performance. This composite approach allows the material to simultaneously satisfy the requirements for ArF exposure compatibility and high-resolution patterning.
Solution Approach 2:
The patent introduces specific functional groups (cyano, carboxyl, or hydroxyl) at localized positions on the alicyclic hydrocarbon structure to improve line edge roughness performance without affecting the overall absorption characteristics. This local modification allows selective enhancement of specific properties while maintaining the bulk material's optical properties.
2Manufacturing precision
If a spacer-type norbornane structure is incorporated into the resin, then the line edge roughness performance is enhanced, but the affinity for developer deteriorates
Solution Approach 1:
The patent introduces hydrophilic groups (carboxyl or hydroxyl) at specific positions on the norbornane structure to improve developer affinity without compromising the line edge roughness performance. This localized functional group addition creates different regions within the polymer structure with specialized functions: the norbornane skeleton provides structural rigidity for line edge roughness, while the hydrophilic groups provide developer affinity.
3Manufacturing precision
If a cyano group is introduced into a norbornane structure, then the line edge roughness performance is improved, but the solubility in solvent deteriorates
Solution Approach 1:
The patent creates a composite structure where the norbornane backbone with cyano groups is combined with solubilizing side chains or groups. This composite approach allows the cyano groups to improve line edge roughness performance while the additional solubilizing components maintain or enhance solvent compatibility, resolving the contradiction between performance and manufacturability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition improves focus latitude and reduces development defects, achieving better resolution and line edge roughness performance, and enhances solvent solubility and developer affinity.
Implementation Method 1
The chemical amplification resist forms a pattern on a substrate by generating an acid in the exposed area when irradiated with radiation such as far ultraviolet light and through a reaction using the acid as the catalyst
Implementation Method 2
a resin containing a repeating unit having a group represented by formula (1), the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid
Data Source
AI summary
An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.