Array Substrate Manufacturing via Color Filter Integration
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Solution Overview
Problem
The production cost of liquid crystal display (LCD) panels remains high due to complex manufacturing processes and large device investments, necessitating a reduction in production costs and an increase in efficiency.
Innovation Solution
A method for manufacturing an array substrate involves forming gate electrodes, insulating layers, active layers, source and drain electrodes, a protective layer, a color filter layer, and a transparent conducting layer, with the color filter layer directly contacting the transparent conducting layer to simplify the process and reduce costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a traditional COA structure manufacturing process is used with multiple insulating layers and photoresist layers, then the structural integrity and electrical insulation are improved, but the manufacturing complexity and production cost increase significantly
Solution Approach 1:
The patent removes the second insulating layer from the traditional COA structure manufacturing process. By eliminating this layer, the patent reduces manufacturing complexity and production cost while maintaining the necessary structural integrity and electrical insulation through the remaining first insulating layer and the color filter layer itself serving as part of the insulating structure.
Solution Approach 2:
The patent combines the color filter layer formation process with the pixel electrode formation process. The color filter layer serves dual purposes: as the color filtering element and as part of the insulating structure, eliminating the need for a separate second insulating layer and reducing the total number of manufacturing steps.
2Manufacturing precision
If multiple photoresist coating, exposing and developing steps are performed, then the precision of color filter formation is improved, but the production time and manufacturing cost increase
Solution Approach 1:
The patent merges the color filter layer formation with the pixel electrode formation into a single integrated process. By using the color filter layer as part of the insulating structure and forming both layers simultaneously, the patent reduces the number of separate photoresist coating, exposing and developing steps while maintaining manufacturing precision.
Solution Approach 2:
The color filter layer serves multiple functions: it provides color filtering, acts as part of the insulating structure, and serves as the basis for pixel electrode formation. This multi-functionality reduces the need for separate processing steps for each function, thereby improving productivity without sacrificing precision.
3Reliability
If additional insulating layers and photoresist layers are added to ensure proper insulation and structure, then the electrical performance is improved, but the production device investment and manufacturing cost increase
Solution Approach 1:
The patent eliminates the second insulating layer and associated photoresist processing steps. The first insulating layer combined with the color filter layer provides sufficient electrical insulation and structural integrity, reducing the need for additional layers and the associated manufacturing costs and device investments.
Solution Approach 2:
The color filter layer is designed to serve multiple functions including color filtering, electrical insulation, and structural support. This multi-functionality reduces the need for separate dedicated insulating layers, thereby lowering material costs, manufacturing complexity, and production device investment while maintaining electrical performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the manufacturing process, increases production efficiency, saves on production device expenses, and reduces overall production costs by eliminating the need for a second insulating layer and additional photoresist layer steps, thereby enhancing productivity.
Implementation Method 1
forming a transparent conducting layer directly on the color filter layer, and etching the transparent conducting layer to form a pixel electrode layer
Implementation Method 2
forming a color filter layer on the protective layer and exposing and developing the color filter layer
Implementation Method 3
etching the first metal layer to form gate electrodes of thin-film transistors; etching the second metal layer to form source electrodes and drain electrodes of the thin-film transistors
Data Source
AI summary
Disclosed are an array substrate and a method of manufacturing the array substrate. The method of manufacturing an array substrate includes: forming a first metal layer on a substrate, and etching the first metal layer; forming an insulating layer on the substrate and the first metal layer; forming an active layer and an ohmic contact layer successively on the insulating layer; etching the active layer and the ohmic contact layer; forming a second metal layer on the ohmic contact layer and the insulating layer, and etching the second metal layer; forming a protective layer on the second metal layer and the insulating layer; forming a photoresist layer on the protective layer, and performing exposure and development; and forming a transparent conducting layer directly on the color filter, and etching the transparent conducting layer to form a pixel electrode layer.