Array Substrate DBS Wire Slits for Light Leakage Reduction
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Solution Overview
Problem
In liquid crystal display (LCD) technology, the overlapping regions between adjacent color-resists on the array substrate lead to horn-shaped terrain, causing light leakage due to changes in liquid crystal polar angles, which affects panel chromaticity and contrast.
Innovation Solution
The introduction of uniform slits on the edges of the DBS common electrode wire, parallel to the scan lines, helps to reduce light leakage by improving the control of liquid crystal molecules and minimizing the electric field distortions caused by terrain topography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of moving object
If adjacent color-resists are arranged on the array substrate to increase aperture ratio, then the aperture ratio is improved, but horn-shaped terrain is formed at overlapping regions causing light leakage
Solution Approach 1:
The DBS common electrode wire is segmented into multiple sections along its length. Each section is independently positioned relative to the color-resist overlapping regions. By segmenting the electrode wire, the patent can create equipotential zones at specific overlapping regions without affecting other areas, thereby controlling light leakage locally while maintaining high aperture ratio overall.
Solution Approach 2:
The patent applies different positioning strategies to different sections of the DBS common electrode wire based on local requirements. At overlapping regions where light leakage occurs, the electrode wire is positioned to create equipotential zones. At non-overlapping regions, the electrode wire follows the standard layout. This local differentiation resolves the contradiction by addressing light leakage only where necessary.
2Area of moving object
If DBS design and COA technology are adopted to increase aperture ratio, then the aperture ratio is improved, but terrain topography differences cause electric field distortion and light leakage
Solution Approach 1:
The patent positions the DBS common electrode wire to form equipotential zones at color-resist overlapping regions. By ensuring that the electrode wire and common electrode maintain the same potential at these critical locations, the patent eliminates electric field distortion caused by terrain topography differences. This equipotential arrangement prevents light leakage while preserving the benefits of DBS design and COA technology for high aperture ratio.
3Reliability
If ITO wires are made slightly wider than data lines for shielding function, then the shielding function is improved, but the terrain topography difference increases causing more light leakage
Solution Approach 1:
The patent changes the positioning parameter of the DBS common electrode wire relative to the color-resist overlapping regions. Instead of simply making the ITO wire wider, the patent adjusts the lateral position of the electrode wire to align with overlapping regions. This parameter change creates equipotential zones that provide shielding function while eliminating light leakage, resolving the contradiction between shielding effectiveness and light leakage prevention.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces light leakage, enhances color gamut, and improves contrast and overall product quality by ensuring uniform electric field distribution across the substrate.
Implementation Method 1
the electric fields formed by the ITO wires and the common electrode can keep the LC molecules from being deflected
Implementation Method 2
the rotation of the LC molecules of the LC layer is controlled by applying a driving voltage on the two substrates
Implementation Method 3
due to the difference in terrain topography and color-resist leveling, the overlapping regions are often present between adjacent color-resists, bumps are generated at the overlapping regions to form a horn-shaped terrain
Implementation Method 4
The introduction of uniform slits on the edges of the DBS common electrode wire, parallel to the scan lines, helps to reduce light leakage by improving the control of liquid crystal molecules and minimizing the electric field distortions caused by terrain topography
Data Source
AI summary
The invention provides an array substrate and manufacturing method thereof. The array substrate comprises: a substrate; a plurality of data lines and scan lines disposed on one side of the substrate, the data lines and the scan lines defining a plurality of sub-pixel areas, the data lines and the scan lines being mutually insulated, the data lines extending in a first direction and being arranged in a second direction crossing the first direction, the scan lines extending in the second direction and being arranged in the first direction; a color-resist layer disposed on the same side of the substrate with the data lines and the scan lines, the color-resist layer comprising a plurality of color-resists, and two adjacent color-resists of the plurality of color-resists having an overlapping area corresponding to an area of a respective one of the data lines; a data black matrix (BM) saving (DBS) common electrode wire extending in the first direction and disposed on a side of the overlapping area of the color-resist layer away from the substrate to shield a data line of the plurality of data lines, and uniform slits disposed at an edge of the DBS common electrode wire in plan view, the uniform slits extending in the second direction and being arranged in the first direction.