Array Substrate Gray-Tone Mask Patterning

The patent combines multiple patterning operations into a single integrated process. Specifically, it forms the gate electrode, active layer, source/drain electrodes, and pixel electrode patterns simultaneously in one patterning step, rather than performing separate patterning operations for each component. This merging of operations reduces the total number of patterning processes from seven to three, simplifying the manufacturing process while maintaining the required precision for each component.

The patent employs a gray-tone or half-tone mask that serves multiple functions simultaneously. This single mask enables the patterning of different components (gate electrode, active layer, source/drain electrodes, pixel electrode) with different pattern densities and geometries in one exposure step. The mask's ability to provide varying light transmission levels allows it to perform multiple patterning functions that would otherwise require separate masks and process steps.

The patent merges multiple sequential patterning operations into a single simultaneous patterning process. By forming all necessary electrode and layer patterns in one exposure and development cycle, the total process time is dramatically reduced from what would be required for seven separate patterning steps to just three integrated steps, thereby improving productivity without sacrificing pattern precision.

The patent performs preliminary structuring by forming a three-dimensional pixel electrode structure before the final patterning step. This preliminary action allows the subsequent patterning process to focus only on defining the precise patterns rather than building both structure and pattern simultaneously, enabling faster processing while maintaining high precision for the final device geometry.

The patent replaces complex mechanical multi-step patterning operations with an optical system using gray-tone or half-tone masks. This optical approach allows multiple pattern definitions to be achieved simultaneously through light transmission variations, maintaining precision that would be difficult to achieve with reduced mechanical process steps. The optical method enables precise pattern formation through controlled light exposure rather than sequential mechanical masking.

The patent utilizes parameter changes in the mask's light transmission properties to achieve different pattern densities and geometries. By varying the gray-tone levels or half-tone densities in different regions of the mask, the process achieves precise control over the resulting patterns for different components. This parameter variation allows a single patterning step to produce multiple distinct patterns with different spatial frequencies and densities, maintaining precision without requiring multiple process steps.