Array Substrate Insulating Layer Thickness Profile for LCD Brightness Uniformity

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Solution Overview

Problem

Conventional liquid crystal display devices suffer from uneven brightness levels and lower aperture rates due to signal attenuation across scanning lines, with existing solutions either reducing line width (affecting aperture rate) or increasing backlight power (increasing power consumption).

Innovation Solution

An array substrate manufacturing method involving a first insulating layer with varying thicknesses, where the sides are thicker than the middle, formed using a grayscale mask and photoresist process to create a concave-shaped pattern, which compensates for signal attenuation and maintains high aperture rates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If the line width of scanning lines is increased to reduce impedance, then the brightness uniformity is improved, but the aperture rate decreases

Engineering Contradiction:
Improvebrightness uniformityVSAvoidaperture rate
Core Design Contradiction:
Illumination intensityVSArea of moving object

Solution Approach 1:

The insulating layer is designed with non-uniform thickness, where the thickness at both sides of the substrate is greater than the thickness at the middle. This local variation in insulating layer thickness compensates for the voltage drop at the edges, improving brightness uniformity without requiring increased scanning line width, thus maintaining high aperture rate

Inventive Principle:
Principle #3Local quality

2Illumination intensity

If the waveform of scanning signals is chamfered to improve brightness uniformity, then the brightness distribution is improved, but the overall brightness level decreases and power consumption increases

Engineering Contradiction:
Improvebrightness distributionVSAvoidpower consumption
Core Design Contradiction:
Illumination intensityVSUse of energy by moving object

Solution Approach 1:

Instead of changing the signal waveform parameters, the invention changes the physical parameter of the insulating layer thickness. By making the insulating layer thickness at both sides greater than at the middle, the voltage distribution is adjusted, improving brightness uniformity while maintaining the original signal waveform and power consumption level

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method achieves even brightness levels across liquid crystal display panels by adjusting the thickness of the insulating layer, effectively addressing the issue of uneven brightness and aperture rates in conventional devices.

Implementation Method 1

using a grayscale mask to expose the photoresist layer; developing the exposed photoresist layer so that the photoresist layer has a curved surface

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Implementation Method 2

performing an etching process on the first insulating layer coated with the photoresist layer having the curved surface so as to form the patterned first insulating layer

Methodology Applied
Scientific EffectEtching:

Implementation Method 3

depositing a first metal layer on a substrate and forming a plurality of scanning lines by performing a patterning process on the first metal layer

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Data Source

PatentUS9733536B2Array substrate manufacturing method, array substrate formed thereby and liquid crystal display apparatus
Publication Date: 2017.08.15 TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD
  • US9733536B2 patent drawing
  • US9733536B2 patent drawing
  • US9733536B2 patent drawing

AI summary

An array substrate manufacturing method, an array substrate formed by the method, and a liquid crystal apparatus are disclosed. The method includes steps of depositing a first metal layer to form a plurality of scanning lines; depositing a first insulating layer and performing a patterning process on the first insulating layer; depositing a semiconductor layer and a second metal layer to form a plurality of data lines and thin-film transistors; depositing a second insulating layer to form a plurality of contact holes; and depositing a transparent layer to form a plurality of pixel electrodes.