Array Substrate Light Shielding Layer via Metal Blackening
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Solution Overview
Problem
The complex and costly manufacturing process of array substrates is exacerbated by the need for multiple patterning processes, which can damage PECVD equipment due to large metal layers, increasing production complexity and cost.
Innovation Solution
A method involving the formation of a light shielding layer using a metal blacken production, which is then used to simplify the patterning process by allowing both the light shielding and preset film layers to be patterned in a single process, reducing the number of patterning steps and improving light shielding performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a metal layer is used for light shielding, then light shielding performance is improved, but PECVD equipment may be damaged due to large metal layers
Solution Approach 1:
The patent divides the light shielding function into two separate layers: a metal layer for primary light shielding and a black matrix layer for secondary light shielding. This segmentation allows the metal layer to be smaller in area, preventing PECVD equipment damage while maintaining overall light shielding performance through the combined effect of both layers.
Solution Approach 2:
The patent changes the material parameter of the light shielding structure by introducing a black matrix material with different optical properties. The black matrix material has high light absorption characteristics, complementing the metal layer's reflective shielding properties, thereby achieving effective light shielding with reduced metal layer area.
2Manufacturing precision
If multiple patterning processes are used to form light shielding layer and active layer patterns, then manufacturing precision is improved, but production complexity and cost increase
Solution Approach 1:
The patent merges the patterning operations for the light shielding layer and the active layer into a single patterning process. By forming both patterns simultaneously using one photoresist layer and one exposure-development cycle, the patent reduces process complexity while maintaining pattern alignment precision through the coordinated patterning of both layers.
Solution Approach 2:
The single patterning process serves multiple functions: it patterns both the light shielding layer and the active layer, and it defines both their respective patterns in one operation. This multi-functionality eliminates the need for separate patterning steps, reducing overall process complexity while achieving the required manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the production process, reduces costs, and enhances the light shielding properties of the array substrate, improving overall performance by eliminating the need for additional patterning steps and minimizing equipment damage.
Implementation Method 1
the light shielding layer is formed by using a metal blacken production, and the metal blacken production is a product by blackening a metal
Implementation Method 2
forming a preset film layer (the preset film layer may include one of a buffer layer, an active layer or the like) on the base substrate which is provided with the light shielding layer through a plasma enhanced chemical vapor deposition (PECVD) process
Data Source
AI summary
A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes the following operations: forming a light shielding layer formed of a metal blacken production on a base substrate, wherein the metal blacken production is a product by blackening a metal; forming a preset film layer on the base substrate which is provided with the light shielding layer; forming both a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process. The method of forming a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process saves one patterning process.