Array Substrate Photo Spacer Integration via Halftone Mask
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing manufacturing process for TFT-LCD display devices is complicated and costly due to the numerous steps involved in forming photo spacers during the color filter process, which increases production time and expense.
Innovation Solution
A method for manufacturing an array substrate that forms a passivation layer with a via hole and a photo spacer on the front side using a halftone mask patterning process, eliminating the need for photo spacers on the back side of the color filter substrate, thereby simplifying the color filter process and reducing the overall manufacturing steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If photo spacers are formed during the color filter process on the back side of the color filter substrate, then the photo spacers can ensure uniform gap and support the substrates, but the manufacturing process becomes complicated with too many steps
Solution Approach 1:
The patent merges the photo spacer formation process with the array substrate manufacturing process. Specifically, the photo spacer is formed on the front side of the array substrate during the passivation layer formation stage, combining two previously separate processes (array substrate fabrication and color filter process) into one integrated flow, thereby reducing overall manufacturing steps while maintaining the photo spacer's functional benefits
2Reliability
If photo spacers are formed during the color filter process, then the substrates are properly supported, but manufacturing time increases due to too many steps
Solution Approach 1:
The patent combines the photo spacer formation with the array substrate manufacturing process by forming the photo spacer on the front side of the array substrate during the passivation layer formation stage. This integration eliminates the need for separate photo spacer formation steps in the color filter process, thereby reducing total manufacturing time while maintaining substrate support functionality
3Manufacturing precision
If photo spacers are formed during the color filter process, then the gap uniformity is ensured, but manufacturing cost increases
Solution Approach 1:
The patent integrates photo spacer formation into the array substrate manufacturing process, specifically during the passivation layer formation stage. By using the same halftone mask patterning process for both the passivation layer and photo spacer formation, the patent eliminates additional material and process costs associated with separate photo spacer formation, thereby reducing manufacturing cost while maintaining gap uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the manufacturing steps and costs associated with the display device, while also shortening the production time by integrating the formation of the passivation layer, photo spacer, and protection layer in a single process, thus simplifying the TFT-LCD manufacturing process.
Implementation Method 1
exposing the substrate using a mask plate having a full light transmission region, a half light transmission region and a light shielding region... performing etching and ashing treatments on the developed substrate to form the passivation layer having the via hole and the photo spacer
Data Source
AI summary
Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.