Array Substrate Photosensitive Component Single Patterning
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Solution Overview
Problem
The manufacturing process of array substrates is complex due to the requirement of two patterning processes for forming the source-drain layer, which affects the yield and efficiency of the process.
Innovation Solution
The array substrate design includes a photosensitive component with a first electrode and a photosensitive layer formed on a base substrate, followed by the formation of a thin film transistor (TFT) on the photosensitive component, allowing the source-drain layer to be formed in a single patterning process, thereby simplifying the manufacturing steps and avoiding the influence of hydrogen elements on the TFT.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If two patterning processes are used to form the source-drain layer, then the manufacturing precision is improved, but the device complexity and manufacturing time increase
Solution Approach 1:
The patent merges the light shielding layer formation with the photosensitive component electrode formation into a single patterning process. The first electrode of the photosensitive component and the light shielding layer are formed simultaneously through one patterning step, eliminating the need for separate patterning processes and reducing overall manufacturing complexity while maintaining precision requirements.
Solution Approach 2:
The light shielding layer is formed preliminarily as part of the photosensitive component structure before the source-drain layer patterning is completed. This preliminary formation of the light shielding layer integrated with the first electrode allows subsequent source-drain layer patterning to proceed with simplified process steps while ensuring proper light shielding is in place.
2Manufacturing precision
If two patterning processes are used to form the source-drain layer, then the manufacturing precision is improved, but the productivity decreases
Solution Approach 1:
The patent combines multiple layer formations (first electrode and light shielding layer) into a single patterning operation, directly reducing the total number of patterning steps required. This merging of operations decreases manufacturing cycle time and improves productivity while the integrated design ensures precision requirements are met through a single high-precision patterning step.
Solution Approach 2:
The manufacturing process is optimized to maintain continuous useful action by eliminating idle time between separate patterning processes. The integrated formation of the first electrode and light shielding layer in one patterning step allows the manufacturing line to proceed more continuously, improving overall productivity without compromising the precision of the source-drain layer formation.
3Device complexity
If the photosensitive component is formed after the TFT, then the manufacturing process is simplified, but hydrogen elements from the photosensitive layer formation affect the TFT electrical properties
Solution Approach 1:
The patent applies preliminary action by forming the light shielding layer integrated with the first electrode before forming the photosensitive layer. This sequence ensures that the light shielding structure is already in place to protect the TFT from hydrogen elements that may be introduced during photosensitive layer formation, thereby preserving TFT electrical properties while maintaining a simplified overall process.
Solution Approach 2:
The light shielding layer serves as a preliminary protective barrier that prevents harmful hydrogen elements from affecting the TFT during photosensitive layer formation. By establishing this protective structure in advance, the patent implements preliminary anti-action to counteract the potential harmful effects before they can occur, maintaining both process simplicity and device reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process by reducing the number of patterning steps required for the source-drain layer, improving the yield and electrical properties of the TFT, and enhancing the overall display quality through compensation technology.
Implementation Method 1
a photosensitive component located on a base substrate and including a photosensitive layer
Data Source
AI summary
Provided are an array substrate, a manufacturing method therefor, a display panel and a display device. The array substrate includes: a photosensitive member and a thin film transistor that are located on a base substrate, the photosensitive member including a photosensitive layer; the thin film transistor is located at a side of the photosensitive member that is far from the base substrate. In the described array substrate, the photosensitive member is formed first, and then the thin film transistor is formed on the photosensitive member, which prevents the element hydrogen from influencing the thin film transistor when forming the photosensitive member, while source and drain layer patterns of the thin film transistor may be formed by means of one-time pattern processing, thus simplifying the manufacturing process.