Array Substrate Single Photomask Touch Integration
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Solution Overview
Problem
The conventional manufacturing method of touch-integrated array substrates is complex, costly, and time-consuming due to its multi-step process and requirement for multiple photomasks and light shielding layers.
Innovation Solution
A simplified manufacturing method that uses a single photomask to form patterned common and metal layers, reducing the need for additional photomasks and light shielding layers, and employs half-tone photomasks to optimize the etching process, thereby streamlining the production of array substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple photomasks and light shielding layers are used to form patterned layers, then the manufacturing precision and electrical connection reliability are improved, but the device complexity and production cost increase
Solution Approach 1:
The patent combines multiple photomasks into a single photomask that integrates the patterns for common electrode layer and first metal layer. This merging reduces the number of photomasks from multiple to one, simplifying the manufacturing process while maintaining the ability to form precise patterns for both layers simultaneously.
Solution Approach 2:
The single photomask serves multiple functions by containing pattern definitions for both the common electrode layer and the first metal layer. This universal photomask replaces multiple specialized photomasks, reducing process complexity while maintaining manufacturing precision through its multi-functional design.
2Reliability
If multiple photomasks and light shielding layers are used to form patterned layers, then the electrical connection reliability is improved, but the production cycle time increases
Solution Approach 1:
The patent merges the patterning steps for common electrode and first metal layer into a single exposure and development process using one photomask. This combination eliminates sequential processing steps, reducing production cycle time while ensuring reliable electrical connections through precise simultaneous pattern formation.
Solution Approach 2:
The single photomask is designed in advance to contain all necessary pattern information for both common electrode and first metal layer. This preliminary preparation allows both layers to be patterned in one go, avoiding multiple sequential operations and reducing overall production time.
3Manufacturing precision
If additional photomasks and light shielding layers are added, then the pattern formation precision is improved, but the production cost increases
Solution Approach 1:
The patent merges multiple photomasks into one integrated photomask that defines patterns for both common electrode and first metal layer. This reduces the quantity of photomasks and light shielding layers needed, lowering material costs and simplifying the manufacturing process while maintaining pattern formation precision.
Solution Approach 2:
The universal photomask performs multiple patterning functions simultaneously, eliminating the need for multiple specialized photomasks and light shielding layers. This multi-functionality reduces material consumption and production costs while preserving the precision required for forming electrical connections.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces production costs, simplifies the manufacturing process, and shortens the production cycle while maintaining the necessary electrical connections and transparency of conductive layers, such as indium tin oxide, for high-resolution touch displays.
Implementation Method 1
exposing the first photoresist layer by a first half-tone photomask and then exposing the first photoresist layer to form a patterned first photoresist layer
Implementation Method 2
using the patterned first photoresist layer as a mask to etch the common electrode layer and the first metal layer by a wet etching process
Implementation Method 3
ashing the patterned first photoresist layer to thin the first portion and remove the second portion
Data Source
AI summary
The present disclosure provides an array substrate and a manufacturing method of the array substrate. The method includes sequentially forming an active layer and an insulating layer on a substrate; forming a common electrode layer and a first metal layer on the insulating layer using a same photomask, wherein the common electrode layer includes touch electrodes; and forming a second metal layer on the pixel electrode layer, wherein the second metal layer includes touch signal lines, and the touch signal lines electrically are electrically connected to the touch electrodes.