Atmospheric Plasma Coating Removal
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional methods for removing polymeric coating layers, such as sanding, are inefficient and can damage substrates, especially those with three-dimensional topographies, and existing plasma techniques require reduced pressures, which are not suitable for all materials and are not effective for irregular surfaces.
Innovation Solution
A method using an ionized gas stream discharged at atmospheric pressure to generate reactive species that react with polymeric coating layers, allowing for partial or complete removal of coating layers from substrates with varying topographies without the need for evacuation or aggressive solvents.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If sanding is used to remove coating layers, then coating layers can be removed, but the substrate may be scratched or marred and the amount of thickness removed is difficult to control
Solution Approach 1:
The patent replaces the mechanical sanding system with a chemical plasma-based system. The plasma discharge generates reactive species that chemically react with and remove polymeric coating layers through oxidation and other chemical reactions, eliminating the mechanical contact and abrasion that causes substrate damage while providing precise control over removal depth.
Solution Approach 2:
The patent utilizes changes in plasma discharge parameters (power, gas composition, pressure, treatment time) to control the rate and extent of coating layer removal. By adjusting these parameters, precise control over the amount of coating removed is achieved without affecting the substrate, as the plasma chemistry can be tuned to selectively target the polymeric coating.
2Reliability
If reduced pressure plasma is used to clean surfaces, then plasma processing can be performed, but the substrate must be evacuated and must be capable of surviving under reduced pressure conditions
Solution Approach 1:
The patent changes the pressure parameter from reduced pressure to atmospheric pressure operation. This eliminates the need for vacuum systems and substrate evacuation while maintaining effective plasma surface treatment. The atmospheric pressure plasma achieves similar or superior cleaning effectiveness without requiring the substrate to withstand vacuum conditions.
Solution Approach 2:
The patent replaces the vacuum mechanical system with an atmospheric pressure plasma system. Instead of using a vacuum pump and evacuated chamber to deliver plasma treatment, the invention uses atmospheric pressure discharge that generates reactive plasma species directly at ambient conditions, simplifying the overall system architecture.
3Quantity of substance
If atmospheric pressure plasma torches with high-power DC or RF discharges are used, then substantial ionization is produced, but the high temperatures can destroy most substrate surfaces
Solution Approach 1:
The patent creates a plasma discharge with localized chemical reactivity rather than uniform thermal energy distribution. By using a dielectric barrier discharge configuration, the plasma generates highly reactive oxygen species and other chemically active species concentrated at the discharge sites, enabling selective chemical reaction with the coating while the overall temperature remains low enough to protect the substrate.
Solution Approach 2:
The patent changes the plasma generation mechanism from high-power thermal ionization to a cold atmospheric pressure discharge that produces chemical reactivity without high temperatures. The discharge parameters are optimized to maximize the production of reactive oxygen species, ozone, and other chemically active components while maintaining temperatures that do not damage the substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables controlled and selective removal of polymeric coating layers from a wide range of substrates, including those with complex geometries, maintaining the integrity of the substrate and previous coating layers, and avoiding the drawbacks of sanding and reduced-pressure plasma techniques.
Implementation Method 1
generating at least one reactive species in an ionized gas stream discharged at atmospheric pressure
Implementation Method 2
the at least one reactive species reacts with the one or more polymeric coating layers such that one or more coating layers are at least partially removed
Data Source
AI summary
The invention provides a method for the at least partial removal of one or more polymeric coating layers from a coated substrate having at least one coated surface. The method includes generating at least one reactive species in an ionized gas stream discharged at atmospheric pressure; and placing the coated surface in the ionized gas stream. The at least one reactive species reacts with the one or more polymeric coating layers such that one or more coating layers is at least partially removed from the coated surface of the substrate at atmospheric pressure.