Electrostatic Cleaning TRIZ Cases
- Hydrogen Plasma Residue Removal for Semiconductor Substrates
A hydrogen-based plasma removes metallic residue from patterned photoresist layers on semiconductor substrates.
- Semiconductor Wafer Cleaning Gas Jet Stagnant Layer Removal
Gas jet thins stagnant liquid film on semiconductor wafer surface to expose fine particles trapped beneath the layer.
- Ophthalmic Glass Washing Unit with High-Pressure Jets
Parallel high-pressure liquid jets clean concave and convex ophthalmic glass surfaces simultaneously using a flared stream pattern.
- Megasonic Cleaning System for Semiconductor Packages
Megasonic cleaning system removes sawing residue without dislodging packages by using inclined jets infused with high-frequency vibrations.
- Ionized Fluid Particle Removal for EUV Lithography
Ionized fluid neutralizes static charge while suction removes particles from EUV lithography substrate stages.
- Sulfonium-Amine Chemistry for Copper Corrosion Inhibition
A sulfonium compound mediates amine-based photoresist stripping to protect copper interconnect surfaces.
- Portable Coil Cleaning Machine with Segmented Tanks
Segmented tanks and interchangeable nozzles resolve the contradiction between mobility and device complexity in HVAC maintenance.
- Dry Cleaning Apparatus for Semiconductor Wafers
A dry cleaning apparatus combines laser-induced shock waves and flash pulses to remove surface contaminants from semiconductor wafers.