Three-Axis Scanning Arm for Semiconductor Wafer Pollutant Measurement
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Solution Overview
Problem
Conventional semiconductor wafer pollutant measurement apparatuses face challenges with scanning accuracy due to complex structures concentrated on a rotational shaft, leading to reduced motion accuracy and the need for additional lighting to maintain nozzle contact and solution bottle alignment.
Innovation Solution
A scanning device with a three-axis position determination structure, featuring a scanning arm with X-axis, Z-axis, and Y-axis movements, combined with a scanning nozzle that inhales and discharges reagent solutions, and a built-in drying mechanism using a halogen lamp and diffusion plate, controlled by a syringe pump for precise surface scanning and drying.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a rotational shaft structure is used for scanning device movement, then the device can perform scanning operations, but the structure becomes complex and motion accuracy decreases
Solution Approach 1:
The scanning device is divided into three independent linear axes (X, Y, Z) instead of using a complex rotational shaft structure. Each axis can move independently along its own guide rail, segmenting the motion control into simpler, separate linear movements that maintain operational capability while reducing structural complexity
Solution Approach 2:
The rotational shaft mechanical system is replaced with a linear motion system using guide rails and linear actuators. This substitution maintains the scanning functionality while eliminating the complexity and accuracy issues associated with rotational shaft mechanisms
2Measurement precision
If additional lighting is added to maintain nozzle contact and solution bottle alignment, then alignment accuracy is maintained, but device complexity increases
Solution Approach 1:
The scanning device's linear motion system inherently maintains alignment through its guided linear paths. The X, Y, Z axes move along predetermined linear trajectories that automatically keep the nozzle and solution bottle aligned, eliminating the need for additional lighting systems or alignment mechanisms
3Manufacturing precision
If a linear three-axis motion system is used instead of rotational shaft, then scanning accuracy improves and structure simplifies, but implementation complexity increases
Solution Approach 1:
The motion system is segmented into three independent linear axes, each with its own guide rail and actuator. This segmentation allows each component to be manufactured and assembled separately using standard linear motion components, reducing overall implementation complexity while maintaining high scanning accuracy
Solution Approach 2:
The linear three-axis motion system uses universal components such as standard guide rails, linear actuators, and positioning mechanisms that can be applied to various scanning applications. This universality reduces implementation complexity by leveraging off-the-shelf components rather than custom-designed mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves scanning accuracy and simplifies the structure, allowing for precise three-axis movement and simultaneous drying of the wafer surface, enhancing the collection of pollutants while maintaining accurate nozzle and solution bottle alignment.
Implementation Method 1
a built-in drying mechanism using a halogen lamp and diffusion plate
Implementation Method 2
controlled by a syringe pump for precise surface scanning and drying
Data Source
AI summary
Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion.