UV-Mediated Liquid Film Substrate Treatment
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Solution Overview
Problem
Current methods for treating semiconductor substrates face challenges in generating a hydrophilic surface, effective cleaning, and removing ions, particularly due to high temperatures and prolonged application times, which can lead to substrate stress and inefficient contaminant removal.
Innovation Solution
A method involving the generation of radicals in a liquid before application to the substrate using UV radiation, with pre-treatment to destroy unwanted reactive components and targeted flow to ensure radical reach, combined with heated liquids and electromagnetic radiation for ion removal, to enhance cleaning and surface modification.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If UV radiation is introduced directly onto the substrate surface in a gas atmosphere, then hydrophobic surface areas are changed into hydrophilic surface areas and organic contaminations are removed, but stress forces and relaxation processes occur in the substrate leading to displacement of structures
Solution Approach 1:
A liquid layer is introduced as an intermediary medium between the UV radiation source and the substrate surface. The liquid absorbs UV radiation and generates radicals that clean the substrate, preventing direct high-energy photon impact on the substrate structures while maintaining effective cleaning action through radical mechanisms
Solution Approach 2:
The patent changes the physical state and interaction parameters by transitioning from direct gas-phase UV radiation to liquid-mediated UV radiation. The liquid layer modifies the radiation delivery mechanism, converting direct high-energy photon impact into a gentler radical-based cleaning process that eliminates substrate stress
2Reliability
If heated liquids are used to remove residual ions from the substrate surface, then ion removal effectiveness is improved, but high temperatures may lead to contaminations in the liquid and reduced solubility of ions
Solution Approach 1:
The patent changes the temperature parameter by using ambient temperature liquids instead of heated liquids. Ion removal effectiveness is maintained through the introduction of radicals generated by UV radiation in the liquid, which provide an alternative mechanism to thermal effects for ion removal
3Reliability
If prolonged application times are used to remove residual ions at reduced temperatures, then ion removal completeness is improved, but efficiency considerations make this undesirable
Solution Approach 1:
The patent changes the chemical mechanism parameter by introducing radicals generated through UV radiation in the liquid. This radical-based mechanism enables effective ion removal at ambient temperature with short application times, replacing the slow thermal dissolution process with a more reactive chemical pathway
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves substrate cleaning efficiency, reduces substrate stress, and effectively removes contaminants and ions, while minimizing energy losses and chemical usage.
Implementation Method 1
UV radiation is introduced into the liquid film in order to generate radicals
Implementation Method 2
the liquid and the UV radiation are matched such that a majority of the UV radiation is absorbed in the liquid film in order to generate radicals therein. In particular, it is known to generate hydroxyl radicals
Implementation Method 3
a oxidation of hydrocarbons at the surface by atomic oxygen, an oxidation of metals at the surface of the substrate by atomic oxygen
Data Source
AI summary
The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate. In one method, in which ions are removed from at least partial areas of the surface of a substrate and near surface layers of said substrate, a liquid, which is heated above ambient temperature is applied to the substrate, in order to form a liquid film on at least a partial area of said substrate, wherein electromagnetic radiation is introduced into said liquid film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said hydrophobic surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, whose surface characteristic is to be changed, and UV radiation of a predetermined range of wavelength is guided through said liquid onto at least the partial area of the surface of said substrate, whose surface characteristic is to be changed. The methods may be performed in a common apparatus in any desired order in series and/or in parallel.