Ionized Fluid Particle Removal for EUV Lithography
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Solution Overview
Problem
The semiconductor industry faces challenges in reducing particles on components within extreme ultraviolet lithography (EUVL) tools due to static electricity buildup during cleaning, which attracts particles and affects the precision of lithography processes.
Innovation Solution
A particle removal device with a handheld module that combines ionized fluid injection and suction to prevent static charge on substrate stages, using an ion generator and fluid generator to create an ionized fluid stream that is then used to remove particles while preventing static electricity from accumulating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional cleaning methods are used to remove particles from substrate stages, then particle removal is achieved, but static electricity builds up and attracts particles back
Solution Approach 1:
The invention uses the ionized fluid stream to neutralize static charge on the substrate stage, converting the harmful static electricity into a beneficial cleaning mechanism. The ionized particles in the fluid attach to charged surfaces and neutralize them, preventing particle attraction while simultaneously removing particles through the suction mechanism.
Solution Approach 2:
The ionized fluid stream acts as an intermediary between the cleaning mechanism and the substrate stage. Instead of direct mechanical contact that generates static, the ionized fluid mediates the cleaning process by neutralizing charges and carrying particles away through suction, eliminating the harmful static buildup effect.
2Quantity of substance
If suction is applied to remove particles, then particle accumulation is reduced, but static electricity may still build up on the substrate stage
Solution Approach 1:
The invention merges two functions into a single integrated system: particle suction and static charge neutralization. The handheld module combines a suction source to remove particles with an ion generator to produce ionized fluid that neutralizes static charge, achieving both particle removal and static prevention simultaneously through one device.
Solution Approach 2:
The handheld cleaning module is designed as a multi-functional device that performs both particle removal via suction and static charge neutralization via ionized fluid generation. This universal device addresses multiple cleaning requirements (particle removal and static prevention) that would traditionally require separate systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively reduces particle accumulation on substrate stages by eliminating static electricity, enhancing the cleaning efficiency and maintaining the precision of lithography processes.
Implementation Method 1
injecting an ionized fluid stream from the nozzle onto the substrate stage to prevent static charge from building up on the substrate stage
Implementation Method 2
providing suction by the nozzle to remove particles from the substrate stage
Data Source
AI summary
A particle removal device, along with methods of using such, are described. The device includes a handheld module having a body. A first one or more channels and a second one or more channels are formed in the body. The body includes a nozzle, and the handheld module is configured to provide suction by the nozzle and to inject an ionized fluid stream by the nozzle. The body further includes a handle attached to the nozzle.