Attraction Device with Resistivity Gradient for Dust Suppression
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Solution Overview
Problem
Conventional electrostatic attraction devices for substrates with insulating films face issues of non-uniform attraction forces, leading to dust generation, substrate breakage, and inconsistent temperature control, due to uneven residual attraction forces, which affect production yield and efficiency.
Innovation Solution
An attraction device with a contact support part and a non-contact part, where the contact support part has a higher volume resistivity than the non-contact part, is designed to provide a uniform attraction force by positioning the contact support part outside the attraction electrode area, reducing friction and dust generation, and allowing for adjustable Johnsen-Rahbek force control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If the attraction voltage is increased to enhance the attraction force on substrates with insulating films, then the attraction force is improved, but material peel-off and dust generation occur due to excessive local attraction force
Solution Approach 1:
The attraction electrode is designed with a specific pattern where the electrode area occupies only 30-70% of the attraction surface area, creating regions of different attraction force density. This local variation in electrode distribution prevents excessive concentration of attraction force in any single area, thereby preventing material peel-off and dust generation while maintaining effective overall attraction.
2Object-generated harmful factors
If the attraction area is reduced to decrease residual attraction force, then dust generation is suppressed, but heat transfer efficiency from the attraction surface to the substrate decreases
Solution Approach 1:
The attraction electrode pattern creates localized high-field regions that concentrate electric flux in specific areas. This non-uniform distribution allows the attraction force to be effective where electrodes are present while maintaining sufficient thermal contact area through the dielectric material, thus balancing residual attraction force reduction with heat transfer efficiency.
3Manufacturing precision
If the attraction electrode pattern is optimized to uniformize attraction force, then attraction uniformity is improved, but device complexity increases due to precise positioning requirements
Solution Approach 1:
The invention specifies quantitative parameters for the attraction electrode pattern, including the electrode area ratio (30-70% of attraction surface area) and positioning relationships. By defining these specific parameter ranges, the patent achieves attraction force uniformity through parameter optimization rather than complex structural designs, balancing manufacturing precision with device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses dust generation, prevents substrate breakage, ensures uniform attraction forces, and prolongs the device's lifespan by controlling the attraction force, thereby improving production yield and versatility.
Implementation Method 1
an electrostatic attraction device has been widely used to precisely control the temperature of a substrate
Implementation Method 2
a main body part (50) having an attraction electrode (11, 12) inside a dielectric
Implementation Method 3
an attraction device (5) having a main body part (50) having an attraction electrode (11, 12) inside a dielectric
Implementation Method 4
in the attraction part, a volume resistivity of a material of the contact support part is greater than a volume resistivity of a material of the non-contact part
Data Source
AI summary
Providing a technique for suppressing dust generation at the time of attraction and detachment of an object to be attracted, and for enabling control the attraction force of the attraction device to be uniform. The attraction device of the present invention includes a main body part having attraction electrodes within a dielectric; and an attraction part for attracting a substrate, provided on a surface of the main body part at an attraction-side. The attraction part includes a contact support part that is in contact with, and supports the substrate and a non-contact part that is not in contact with the substrate. In the attraction part, the volume resistivity of the material of the contact support part is greater than the volume resistivity of the material of the non-contact part.