Electric Discharge Tubes TRIZ Cases

A meter electrode uses a dielectric RF window to maintain characteristic impedance for radio frequency current measurement.

A non-magnetic heater in the focus ring section compensates for thermal differences to prevent deposits and ensure uniform etching.

Segmented AlTiN coatings mitigate stress-induced delamination by buffering residual compressive stresses while maintaining hardness above 25 GPa.

A grounded power adapter uses a perpendicular ground channel to isolate the ground connector from the power connector within a compact base.

A sample holder uses a power separator to distribute input movement into linear and rotational actions.

A lamp socket uses molded ribs to form key grooves that catch mismatched bulb keys, ensuring correct alignment.

Tapered plasma density adjusting members and core members diffuse inductive plasma to equalize in-plane density distribution across large substrates.

Rapid restart within ten seconds prevents yield loss from tube arcing in diamond synthesis.

A charged particle source arrangement uses a membrane to separate vacuum regions while transmitting the primary beam.

Magnetic confinement directs plasma to separate target priming and deposition zones, eliminating delays from sequential target replacement.

A plasma treatment method modifies non-conductor surfaces using a planar plasma generated by coplanar dielectric barrier discharge.

A dense boron carbide edge ring utilizes a multi-layer CVD structure to enhance plasma resistance and durability.

Roughened electrode plates accept laser irradiation to form ventilation holes, eliminating pilot drilling steps that reduce productivity.

A scanning electron beam device adjusts focus via stage movement and retarding voltage to measure deep features.

Central microwave feeding via a triangular antenna compensates for varying substrate passage times to ensure uniform film deposition.

Reciprocating electrode supports retract from mounting recesses to eliminate obstruction during reconditioning while maintaining purge gas flow.

Movable support members accommodate thermal expansion of the gas supply member, distributing stress to prevent concentration on the supporting structure.

An insulating elastomeric compression member applies localized force to secure film heaters in plasma processing showerheads.

A thermally conductive sheet with a non-adhesive layer transfers heat between the focus ring and mounting table.

Segmented gas delivery channels prevent microcrack contamination in plasma processing by isolating corrosive gases from aluminum alloy liners.

Grounded auxiliary electrodes intercept electrons from the internal space, reducing Joule heat in closing members and extending seal material lifespan.

An angled vacuum gap between the probe head and upper electrode extends o-ring life by blocking direct plasma flux.

Periodic deposition shields sidewalls against over-etching while inductive plasma removes unwanted material from deep high aspect ratio features.

Optical imaging replaces electron beams to guide focused ion beam micromachining, preventing sample damage and artifacts during lamella preparation.

A control method fixes irradiating lens conditions to enable rapid switching between image and diffraction observation modes in transmission electron microscopes.

A hexagonal light guiding strip with diffusion patterns guides LED light, eliminating separate light guides to reduce backlight module weight.

Thick insulation layers in gas electron multipliers constrain electron spread and improve positional resolution.

Dual controllers coordinate drive and supply voltage adjustments to reduce transistor thermal stress while maintaining amplifier efficiency.

Impedance controllers adjust edge contact points to correct nonuniform electromagnetic fields across large substrates.

An external movable aperture dynamically adjusts opening size to optimize visibility of hole and groove bottoms without increasing internal vacuum complexity.

A precursor gas enables focused ion beam milling of copper and dielectric layers at matched rates to produce a uniformly smooth floor.

A vacuum attraction device uses a contact support part with higher volume resistivity than the non-contact part to hold substrates.

A silicon-based dopant gas composition enhances beam current without degrading the ion source.

Replacing tungsten with graphite and carbides in the arc chamber eliminates harmful tungsten fluoride formation, extending source life.

A condensation suppressing method measures surface temperature and air dew-point to control low-dew-point air supply into a closed space.

Dual objective lens controller cancels stray magnetic fields at the sample position to preserve intrinsic magnetic states during high-precision imaging.

Radial magnetization prevents field lines from intersecting the wall, resolving volume reduction trade-offs in multipolar confinement.

Modular lithographic tool clusters route workpieces via transfer assemblies to reduce time delays and maintenance backlogs.

Stamped and formed crimp contacts reduce material waste from machining while maintaining dimensional accuracy.

A differential gas bleed channel distributes neutralizing gas across an ion beam to enhance current density and homogeneity.

Vertical displacement of the central edge ring changes gap geometry, allowing gas flow and electric fields to peel particles from inaccessible bottom surfaces.

A charged particle beam apparatus controls plasma electrode voltage based on gas pressure to achieve stable discharge.

A fixed upstream electrode serves as a suppressor and beam optical element in ion beam transport channels.

Dynamic focus ring positioning compensates for tool degradation and feature size variations to maintain precise etch profiles.

Monitoring plasma emission intensities enables precise control of reactor heating and cleaning steps after idling, maintaining critical dimension accuracy.

A Cu-Ga sputtering target with controlled grain size suppresses abnormal discharges in CIGS solar cell manufacturing.

Wavelet analysis filters noise from high-rate signals to detect wafer arcing, preventing yield loss and false positives.

UV-reflective window patterns prevent avian collisions without compromising the transparent view for human occupants.

Optimizing target spacing and rotation angles reduces particle travel variations, ensuring consistent film characteristics across the substrate.