Gas Supply Member Support Device for Plasma Processing

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Solution Overview

Problem

Existing plasma processing apparatuses face frequent maintenance issues due to stress concentration on supporting members during plasma processes, as these members are fixed and cannot accommodate thermal expansion differences between the metal sidewall and dielectric gas supply members.

Innovation Solution

The apparatus includes a gas supply member supported by first fixed and second movably supported members, allowing the gas supply member to move with thermal expansion, thereby distributing stress and preventing concentration on the supporting members.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If supporting members are fixed to both the sidewall and gas supply member, then the gas supply member is stably supported, but stress concentrates on the supporting members causing frequent maintenance

Engineering Contradiction:

Improvestability of gas supply memberVSAvoidreliability of supporting members

Core Design Contradiction:

Stability of the object's compositionVSReliability

Solution Approach 1:

The supporting member is designed with a movable connection to the gas supply member, allowing it to dynamically adjust its position in response to thermal expansion forces. This dynamic capability enables the supporting member to maintain stable support while accommodating dimensional changes, preventing stress concentration and failure.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The supporting member's connection characteristics are changed from completely fixed to partially movable, allowing it to change its mechanical properties in response to temperature variations. This parameter change enables the supporting member to absorb thermal expansion forces while maintaining stable support of the gas supply member.

Inventive Principle:

Principle #35Parameter changes

2Ease of manufacture

If supporting members are fixed rigidly, then installation is simple, but thermal expansion differences between metal sidewall and dielectric gas supply member cause stress concentration

Engineering Contradiction:

Improveease of installationVSAvoidstress on supporting members

Core Design Contradiction:

Ease of manufactureVSStress or pressure

Solution Approach 1:

The supporting member incorporates a movable connection mechanism that allows it to adjust its position dynamically in response to thermal expansion. This dynamic design maintains installation simplicity while eliminating the stress concentration problems associated with rigid fixed connections.

Inventive Principle:

Principle #15Dynamics

3Reliability

If supporting members are made more numerous and closer together, then gas supply stability improves, but stress distribution still concentrates on individual members

Engineering Contradiction:

Improvegas supply stabilityVSAvoidcomplexity of supporting structure

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

By making the supporting members dynamically adjustable rather than statically fixed, the system achieves reliable gas supply stability with fewer supporting members. The dynamic capability of each supporting member to accommodate thermal expansion eliminates the need for increased numbers of supporting members, thereby avoiding increased structural complexity.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration ensures stable gas supply and reduced maintenance needs by allowing the gas supply member to move with thermal expansion, maintaining secure gas delivery during plasma processes.

Implementation Method 1

allowing the gas supply member to move with thermal expansion, thereby distributing stress and preventing concentration on the supporting members

Methodology Applied

Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentUS8663424B2Plasma processing apparatus and gas supply member support device

Publication Date: 2014.03.04 TOKYO ELECTRON LTD

AI summary

There is provided a plasma processing apparatus capable of performing a plasma process while surely supplying a gas. The plasma processing apparatus includes an outer gas supply member having gas supply openings for supplying a plasma processing gas and a jacket configured to support the outer gas supply member within a processing chamber and serving as a gas supply member supporting device. The jacket includes three supporting members installed so as to connect the outer gas supply member and a sidewall and arranged at a certain distance in a direction in which the outer gas supply member extends and mounts fixed to the sidewall so as to mount the supporting members therein. The supporting members include a first supporting member fixed to a first mount and a second supporting member movably supported in a second mount.