Charged Particle Source Membrane Gas Barrier
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Charged particle beam devices face challenges in maintaining high stability and vacuum quality due to contamination from residual gases, which affect the performance of the charged particle source and lead to instability and reduced emission efficiency.
Innovation Solution
A charged particle source arrangement with a membrane acting as a gas barrier between two vacuum regions, allowing the primary charged particle beam to pass through while preventing gas molecules from contaminating the source, and utilizing differential pumping to maintain improved vacuum conditions in the source region.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single vacuum region is used for the charged particle source, then the vacuum system is simpler, but residual gases contaminate the source leading to poor emission stability
Solution Approach 1:
The vacuum system is divided into two separate vacuum regions (first vacuum region and second vacuum region) separated by a membrane. The charged particle source is located in the first vacuum region with better vacuum conditions, while the second vacuum region can have poorer vacuum conditions. This segmentation allows independent optimization of vacuum quality for the source region without complicating the entire vacuum system.
Solution Approach 2:
A membrane is introduced as an intermediary element between the first and second vacuum regions. The membrane allows the primary charged particle beam to pass through while preventing gas molecule contamination from the second vacuum region to the first vacuum region where the charged particle source is located. This intermediary enables differential pumping and protects the source from contamination.
2Reliability
If the vacuum pressure is reduced to improve source performance, then emission stability improves, but the risk of contamination from residual gases increases
Solution Approach 1:
The vacuum system is segmented into two regions with different pressure levels. The first vacuum region containing the charged particle source maintains lower pressure (better vacuum) to reduce gas contamination and improve emission stability, while the second vacuum region can operate at higher pressure. This segmentation allows the source region to achieve the necessary vacuum quality without requiring the entire system to maintain equally low pressures.
Solution Approach 2:
The membrane acts as a barrier that prevents gas molecules from the second vacuum region from reaching the charged particle source in the first vacuum region. This allows the first vacuum region to maintain very low pressure levels for optimal source performance while the second region can have less stringent vacuum requirements, reducing the overall harmful gas contamination effect.
3Reliability
If a membrane is introduced to separate vacuum regions, then gas barrier protection is achieved, but the device structure becomes more complex
Solution Approach 1:
The membrane serves multiple functions simultaneously: it acts as a gas barrier preventing contamination from the second vacuum region to the first vacuum region, it allows the primary charged particle beam to pass through for beam transmission, and it enables differential pumping between the two vacuum regions. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity.
Solution Approach 2:
A thin membrane is used instead of rigid walls or complex mechanical separation systems. The membrane provides effective gas barrier protection while being structurally simple and allowing beam transmission. This approach to using flexible thin films achieves source stability protection with minimal structural complexity compared to alternative rigid separation mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the stability and performance of the charged particle source by reducing contamination and maintaining high vacuum levels, leading to improved emission stability and brightness of the primary charged particle beam.
Implementation Method 1
a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region
Implementation Method 2
the membrane is configured to let pass at least a portion of the primary charged particle beam through the membrane
Implementation Method 3
a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region
Data Source
AI summary
The present disclosure provides a charged particle source arrangement for a charged particle beam device. The charged particle source arrangement includes: a first vacuum region and a second vacuum region; a charged particle source in the first vacuum region, wherein the charged particle source is configured to generate a primary charged particle beam; and a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region, and wherein the membrane is configured to let at least a portion of the primary charged particle beam pass through the membrane, wherein a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region.