FIB Micromachining with Optical Microscope Guidance
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Solution Overview
Problem
Existing FIB micromachining methods for electron microscopy samples, particularly organic and beam-sensitive materials, induce artifacts and chemical modifications due to electron beam exposure, making high-resolution imaging challenging.
Innovation Solution
An integrated FIB and light optical microscope system that allows non-invasive determination and micromachining of regions of interest, minimizing sample damage by using light microscopy to guide the FIB, adjusting settings like beam current and trajectory, and producing lamella suitable for electron microscopy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If electron beam exposure is used for imaging and positioning in FIB micromachining, then navigation and positioning capability is improved, but sample damage and artifact induction increase
Solution Approach 1:
The patent introduces an optical microscope as an intermediary imaging system that does not damage the sample. The optical microscope images are captured, processed to identify regions of interest, and then used to guide the FIB micromachining process, replacing the damaging electron beam for navigation purposes.
Solution Approach 2:
The patent extracts the imaging function from the electron beam system and separates it into a dedicated optical microscope system. This allows the electron beam to be used solely for micromachining while the optical microscope handles all navigation and positioning imaging, preventing electron beam-induced sample damage.
2Manufacturing precision
If FIB micromachining is used for high precision sample preparation, then manufacturing precision is improved, but sample vulnerability to chemical reactions increases due to free charge carriers
Solution Approach 1:
The patent performs preliminary imaging and region of interest identification using the non-damaging optical microscope before initiating FIB micromachining. This allows careful planning of the micromachining path and parameters to minimize exposure of vulnerable regions to the ion beam, reducing chemical reactions and composition changes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise, artifact-free micromachining of vulnerable materials, allowing high-resolution imaging without prior electron beam exposure, and producing lamella for TEM analysis.
Implementation Method 1
a light optical microscope, wherein the light optical microscope is configured for imaging or monitoring the sample on the sample holder
Implementation Method 2
a focused ion beam exposure system comprising an assembly for projecting a focused ion beam onto a first position where, in use, the focused ion beam impinges on the sample held by the sample holder
Data Source
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AI summary
The invention relates to an apparatus and a method for micromachining samples. The apparatus comprises an integral combination of: a sample holder, a focused ion beam (FIB) exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope (LM), wherein the LM is configured for imaging or monitoring said first position. The method comprises the steps of: - capturing LM images of the sample; - determining a position and physical dimensions of a region of interest in the sample based on the LM images; - establish from the LM images settings of the sample holder and/or the FIB exposure system, for micromachining the sample to bring the region of interest more closer to the surface, and move the sample or the trajectory of the FIB to locate the first position on the sample accordingly, and - activate the FIB for micromachining the sample.