Movable Edge Ring Cleaning via Piezoelectric Actuation
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Solution Overview
Problem
Conventional cleaning methods face difficulties in removing particles from the bottom surfaces and gaps of movable parts within a processing chamber, particularly the edge rings and their neighboring components, due to the complexity of convection generation and particle detachment.
Innovation Solution
A method involving the application of a direct current voltage to the electrostatic chuck and vertical movement of the central edge ring using a piezoelectric actuator, which changes the electric field direction and intensity, enhances particle removal from the edge rings and their surrounding areas by peeling off particles with both electric force and gas flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the edge ring structure is used to surround the substrate, then substrate processing is enabled, but particle accumulation in the gap between the edge ring and substrate occurs
Solution Approach 1:
The edge ring is designed as a movable component that can be vertically displaced by a moving mechanism. During cleaning, the edge ring is moved upward or downward to change the gap between it and the substrate, enabling gas flow to access and remove particles from previously inaccessible bottom surfaces and gaps of movable parts.
Solution Approach 2:
The cleaning process utilizes periodic movement of the edge ring combined with gas supply. The edge ring is moved to create varying gap distances, and gas is supplied in coordination with this movement, creating periodic action that effectively removes particles from the gap region between the edge ring and substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively removes particles from hard-to-reach areas, improving the cleaning efficiency and reducing particle accumulation, thereby enhancing the yield and productivity of substrate processing.
Implementation Method 1
vertical movement of the central edge ring using a piezoelectric actuator
Implementation Method 2
applying a direct current voltage to the electrostatic chuck
Implementation Method 3
remove the peeled-off particles by viscous force of the gas
Implementation Method 4
remove the peeled-off particles by viscous force of the gas
Data Source
AI summary
A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.


