Backside Support Pillars for 3D Memory Stack Stability
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Solution Overview
Problem
Current three-dimensional memory devices face challenges in achieving high density and efficient integration of support pillar structures within their architecture, which affects the overall performance and reliability of the memory stack structures.
Innovation Solution
The proposed solution involves forming alternating stacks of insulating and conductive layers over a substrate, with strategically placed backside trenches and support pillar structures that extend through multiple tiers, allowing for vertical semiconductor channels and memory films to be integrated efficiently, and replacing sacrificial material layers with conductive layers to create a robust memory device architecture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If support pillar structures are integrated into three-dimensional memory devices, then structural stability and reliability are improved, but device complexity and manufacturing difficulty increase
Solution Approach 1:
The support pillar structures are nested within the alternating stacks of insulating and conductive layers, with pillars extending through multiple tiers of the memory device. This nesting approach provides structural stability while integrating the support function within the existing memory architecture rather than adding separate external support structures.
Solution Approach 2:
The support pillar structures are segmented into multiple discrete pillars distributed throughout the alternating stacks, rather than using a single continuous support structure. This segmentation allows the support function to be distributed across multiple locations, improving overall structural stability while maintaining manufacturability through standardized fabrication processes.
2Reliability
If auxiliary support pillar structures are added to enhance structural integrity, then reliability is improved, but manufacturing process complexity increases
Solution Approach 1:
The auxiliary support pillar structures are formed during the preliminary stages of manufacturing, concurrent with the formation of the alternating stacks and memory openings. By establishing the support pillars early in the fabrication sequence, the structural integrity is ensured from the outset without requiring additional later processing steps.
Solution Approach 2:
The auxiliary support pillar structures serve multiple functions: providing structural integrity during subsequent processing steps, serving as alignment references for memory opening formation, and potentially functioning as electrical contacts or interconnect elements. This multi-functionality reduces the need for separate dedicated support structures.
3Quantity of substance
If multiple tiers of alternating stacks are integrated, then memory density is improved, but structural stability and manufacturing precision requirements increase
Solution Approach 1:
The alternating stacks are formed with uniform layer thicknesses and consistent material compositions across multiple tiers, creating equipotential conditions for subsequent processing. This uniformity ensures that etching, deposition, and other fabrication steps proceed evenly across all tiers, maintaining alignment precision while achieving high memory density.
Solution Approach 2:
The auxiliary support pillar structures serve as intermediary reference elements between the multiple tiers of alternating stacks. These pillars provide physical and visual references that guide alignment during memory opening formation and subsequent processing steps, enabling precise multi-tier integration without requiring excessive manufacturing precision.
Data Source
AI summary
A row of backside support pillar structures is formed through a first-tier alternating stack of first-tier insulating layers and first-tier sacrificial material layers. At least one upper-tier alternating stack can be formed, and memory stack structures can be formed through the alternating stacks. A backside trench can be formed through the alternating stacks selective to the row of backside support pillar structures. The sacrificial material layers are replaced with electrically conductive layers, and the backside trench can be filled with a backside trench fill structure, which includes the row of backside support pillar structures. The row of backside support pillar structures reduces or prevents tilting or collapse of the alternating stacks during replacement of the sacrificial material layers with the electrically conductive layers.


