Stacked Baking Chamber Thermal Isolation for Liquid Processing
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Solution Overview
Problem
Heat from baking units in substrate processing apparatuses can affect liquid processing units, leading to temperature changes in chemical liquids and resulting in processing irregularities during substrate processing.
Innovation Solution
A substrate processing apparatus with multiple baking chambers stacked in a specific direction, isolated from the surrounding area by an enclosing isolating space, and a separate liquid processing unit to prevent thermal effects from the baking chambers, ensuring that liquid processing occurs without heat interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If baking chambers are stacked in a compact configuration to save space, then device productivity and space utilization are improved, but thermal effects from baking chambers affect liquid processing units causing processing irregularities
Solution Approach 1:
The apparatus is divided into distinct thermal zones: hot zones (baking chambers) and cool zones (liquid processing unit), separated by thermal isolation structures including insulating walls and air gaps. This segmentation allows compact stacking while preventing thermal interference between units.
Solution Approach 2:
Thermal isolation structures including insulating walls and air gaps act as intermediaries between baking chambers and liquid processing units. These intermediaries block heat transmission while allowing the chambers to remain in close proximity for space efficiency.
2Device complexity
If baking chambers are positioned close to liquid processing unit to reduce apparatus size, then device complexity is reduced, but heat from baking chambers alters chemical liquid temperature causing processing rate changes
Solution Approach 1:
The thermal field is extracted or separated from the overall apparatus structure by introducing thermal isolation structures. This allows the liquid processing unit to be positioned close to baking chambers for structural simplicity while maintaining temperature stability through the isolating barriers.
Solution Approach 2:
Insulating walls and air gaps serve as thermal intermediaries that physically separate the heat source (baking chambers) from the temperature-sensitive liquid processing unit, enabling close positioning without thermal interference.
3Area of stationary object
If processing liquid supply device is positioned near baking chambers for compact design, then space is saved, but heat transfer to processing liquid supply device affects liquid processing stability
Solution Approach 1:
Thermal isolation is applied locally at critical interfaces between baking chambers and the liquid processing unit. Insulating walls and air gaps are positioned specifically where heat transmission would occur, allowing the supply device to be compact while protecting temperature-sensitive components.
4Manufacturing precision
If baking chambers are enclosed in isolating space to prevent heat transmission, then liquid processing stability is improved, but processing gas may escape into surrounding area
Solution Approach 1:
The enclosing isolating space serves multiple functions simultaneously: it provides thermal isolation to prevent heat transmission to the liquid processing unit, and it acts as a containment barrier to prevent processing gas from escaping into the surrounding area. This multi-functionality resolves the contradiction between thermal isolation and gas containment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively eliminates thermal effects from baking chambers, preventing processing irregularities in liquid processing and ensuring consistent substrate processing outcomes.
Implementation Method 1
an enclosing isolating space that encloses the sides of the plurality of baking chambers and isolates the baking chambers from the surrounding area
Data Source
AI summary
A substrate processing apparatus including a plurality of baking chambers stacked in a prescribed direction, each baking chamber carrying out heat treatment of a substrate in its interior, a processing unit having a liquid processing chamber separate from the baking chambers and carrying out liquid processing of the substrate using the processing liquid, and an enclosing isolating space that encloses the sides of the plurality of baking chambers and isolates the baking chambers from the surrounding area.


