Charged Particle Beam Apparatus Foreign Matter Observation
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Solution Overview
Problem
Existing charged particle beam apparatuses do not effectively analyze foreign matters generated during the transportation or observation of semiconductor wafers, as changes in the electromagnetic field can cause foreign matter adhesion, which is not accounted for in previous solutions.
Innovation Solution
A charged particle beam apparatus is designed with a sample stage that includes a foreign matter observation sample, allowing for the observation of foreign matters using a foreign matter observation unit, such as an optical microscope, to estimate the presence and quantity of foreign matters adhering to the measurement sample by simulating the electromagnetic environment and using alignment patterns for precise alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a charged particle beam apparatus is used to observe semiconductor wafers, then observation capability is improved, but foreign matters may be generated due to electromagnetic field changes and adhesion to the sample
Solution Approach 1:
The patent introduces a sample stage that serves as an intermediary component between the charged particle beam apparatus and the semiconductor wafer. The sample stage includes a foreign matter collection region that intercepts and collects foreign matters before they can adhere to the observation target, thereby preventing contamination while maintaining observation capability
Solution Approach 2:
The patent extracts the foreign matter collection function from the main observation system by providing a separate sample stage with dedicated foreign matter collection regions. This separates the harmful foreign matter accumulation from the observation target, allowing the observation capability to be maintained without the contamination problem
2Measurement precision
If dummy wafers with holes are used to analyze foreign matter positions, then analysis capability is improved, but foreign matters generated during transportation and observation are not accounted for
Solution Approach 1:
The patent makes the sample stage multi-functional by integrating both the observation target placement function and the foreign matter collection function into a single component. The sample stage can accommodate different types of samples and simultaneously collect foreign matters from various sources including transportation and observation processes, providing comprehensive foreign matter analysis capability
Solution Approach 2:
The patent performs preliminary action by collecting foreign matters on the sample stage during the transportation and observation processes before they can contaminate the observation target. This proactive collection approach ensures that all foreign matters are captured and analyzed, not just those that manage to reach the target
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the analysis and estimation of foreign matters generated during transportation or observation, providing a means to detect and address foreign matter adhesion accurately, thereby maintaining semiconductor device yield.
Implementation Method 1
a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam
Implementation Method 2
In the observation of the charged particle beam apparatus, in accordance with changes in observation conditions such as an observation view field or an observation magnification, an electromagnetic field around the sample changes. Changes in the electromagnetic field are generation factors of foreign matters
Data Source
AI summary
Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.