Beam Blanking Duty Ratio Control for Tilted Sample Tomography

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Solution Overview

Problem

Conventional charged particle beam systems require excessively long data acquisition times when controlling electron beam dose for tomography, leading to sample drift and image quality deterioration due to prolonged exposure and beam irradiation damage.

Innovation Solution

A charged particle beam system with a beam blanker, sample stage, and controllers to adjust the duty ratio of a pulsed beam based on the sample's tilt angle, ensuring consistent electron beam dose and reducing acquisition time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the exposure time is lengthened with increasing tilt angle to maintain consistent electron beam dose, then the electron beam dose can be controlled uniformly, but the data acquisition time becomes excessively long

Engineering Contradiction:
Improveelectron beam dose controlVSAvoiddata acquisition time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent applies periodic action by using a pulsed electron beam instead of continuous illumination. The beam is turned on and off in periodic cycles, allowing the system to accumulate sufficient dose over multiple pulses without requiring excessively long continuous exposure times at each tilt angle. This resolves the contradiction by maintaining dose control while significantly reducing total acquisition time.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The patent implements dynamics by making the duty ratio of the pulsed beam adjustable based on the tilt angle. As the tilt angle changes, the system dynamically modifies the beam's on/off cycle ratio to maintain consistent dose delivery. This dynamic adjustment allows the system to adapt to varying sample thicknesses at different angles without requiring uniformly long exposure times.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If the exposure time is extended to control electron beam dose, then dose uniformity is achieved, but sample drift occurs and image quality deteriorates

Engineering Contradiction:
Improveelectron beam dose uniformityVSAvoidimage quality
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

By using periodic pulsed beam illumination rather than continuous exposure, the system achieves the necessary cumulative dose while minimizing the total time the sample is exposed to the beam. This reduces sample drift during acquisition and maintains image quality, while still achieving dose uniformity through the controlled pulse cycles.

Inventive Principle:
Principle #19Periodic action

3Manufacturing precision

If the data acquisition time is prolonged to control electron beam dose, then dose consistency is maintained, but beam irradiation damage to the sample increases

Engineering Contradiction:
Improveelectron beam dose consistencyVSAvoidbeam irradiation damage
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The periodic pulsed beam delivery system maintains consistent cumulative dose by controlling the number and duration of pulses, while the intermittent off-periods allow the sample to recover between exposures. This significantly reduces total beam irradiation damage compared to continuous exposure, while maintaining dose consistency across different tilt angles through dynamic duty ratio adjustment.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach prevents prolonged data acquisition times, minimizes sample drift, and reduces beam-induced damage by maintaining a consistent electron beam dose across varying tilt angles, enhancing image quality.

Implementation Method 1

the beam blanker may be electrostatic deflecting plates

Methodology Applied
Scientific EffectElectrostatic deflection: Electrostatics

Data Source

PatentEP4167267B1Charged particle beam system and control method therefor
Publication Date: 2024.01.17 JEOL LTD
  • EP4167267B1 patent drawingFigure 1~2
  • EP4167267B1 patent drawingFigure 3
  • EP4167267B1 patent drawing

AI summary

There is provided a charged particle beam system capable of preventing the data acquisition time from increasing. A control method for the system is also provided. The charged particle beam system (1) includes: a beam blanker (12) for blanking a charged particle beam; a sample stage (15) on which a sample (S) is tiltably held and thus can assume a tilt angle; a blanking controller (102) for controlling the blanking of the charged particle beam and causing a pulsed beam having a duty ratio to be directed at the sample (S); and a tilt controller (104) for controlling the tilt angle (θ) of the sample (S). The blanking controller (102) sets the duty ratio (DR) of the pulsed beam based on the tilt angle (θ) of the sample (S).