Charged Particle Beam Chuck With Contactless Ring Electrode
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing electrostatic chuck mechanisms in charged particle beam devices, such as scanning electron microscopes, face challenges in suppressing sample deformation due to temperature differences between the sample and the attraction surface, leading to beam deflection and reduced throughput.
Innovation Solution
The implementation of a charged particle beam device with an electrostatic chuck mechanism that includes a stage with a ceramic dielectric layer and a ring-shaped correction electrode supported independently, allowing for contactless voltage application and minimizing thermal expansion differences between the ceramic and aluminum components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the correction electrode is directly coupled to the dielectric layer for high-precision alignment, then beam deflection suppression is improved, but thermal warping of the attraction surface occurs due to heat transfer
Solution Approach 1:
The correction electrode is segmented from the dielectric layer by introducing an insulating body between them. This segmentation allows the correction electrode to be positioned independently for beam deflection correction while preventing thermal conduction to the dielectric layer, thus avoiding attraction surface warping.
Solution Approach 2:
An insulating body is introduced as an intermediary between the correction electrode and the dielectric layer. This intermediary component serves dual purposes: it maintains the electrical insulation necessary for correction electrode operation while simultaneously blocking thermal conduction path, preventing heat transfer that would cause thermal warping.
2Reliability
If the sample temperature differs from the attraction surface temperature, then thermal expansion differences cause warping, but direct coupling intensifies this effect
Solution Approach 1:
The insulating body acts as a thermal intermediary that blocks heat flow between the sample and the correction electrode assembly. This prevents thermal expansion differences from causing relative displacement between components, maintaining beam focus stability despite temperature differences.
Solution Approach 2:
The insulating body provides beforehand cushioning against thermal effects by pre-establishing a thermal barrier. This prevents thermal warping before it can occur, compensating for the inevitable temperature differences between sample and attraction surface.
3Manufacturing precision
If the attraction surface warps due to heat transfer, then sample deformation occurs, but this is not addressed in existing designs
Solution Approach 1:
The insulating body serves as a thermal intermediary that blocks heat transfer from the sample to the correction electrode and dielectric layer assembly. This prevents the chain reaction of heat transfer → thermal expansion → attraction surface warping → sample deformation, thereby maintaining sample flatness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses sample deformation caused by temperature differences, maintaining beam focus and reducing the focus time, thereby enhancing the throughput of the device.
Implementation Method 1
The electrostatic chuck applies a voltage to a metal electrode provided therein, a positive or negative charge is generated on surfaces of an object to be attracted and the electrostatic chuck, and the object to be attracted is fixed by a Coulomb force acting therebetween
Implementation Method 2
an insulating body which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck
Implementation Method 3
a ring-shaped electrode which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied
Data Source
AI summary
A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.