Charged Particle Beam Control for Positional Misalignment
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Solution Overview
Problem
In exposure apparatuses with multiple charged particle beam optical systems, the interaction between electron beams can cause positional misalignment of irradiation areas, leading to deteriorated exposure accuracy due to the influence of one electron beam on another, making it challenging to precisely control and correct these misalignments in real-time during the exposure process.
Innovation Solution
A control apparatus is implemented to generate and utilize position misalignment information, calculated from test exposures, to adjust the irradiation positions of electron beams, ensuring accurate alignment by considering the interactions between electron beams and minimizing the calculation cost during the exposure process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple charged particle beam optical systems operate simultaneously, then productivity is improved through parallel processing, but manufacturing precision deteriorates due to electron beam interactions causing positional misalignment
Solution Approach 1:
The patent performs test exposures before actual production exposures to measure the influence of electron beam interactions. The control apparatus calculates misalignment amounts based on these preliminary test results and stores correction data, which is then applied during actual exposure operations to maintain precision while enabling parallel processing
Solution Approach 2:
The system uses test exposure results as feedback to determine correction amounts for subsequent exposures. The control apparatus continuously monitors and adjusts the positioning of multiple beam optical systems based on measured interaction effects, ensuring that productivity gains from parallel processing do not compromise exposure accuracy
2Manufacturing precision
If real-time correction of electron beam interactions is implemented, then manufacturing precision is improved, but device complexity increases due to additional control mechanisms
Solution Approach 1:
The control apparatus calculates misalignment correction amounts in advance during test exposures, before actual production begins. This preliminary calculation eliminates the need for complex real-time computation systems during high-speed exposure operations, reducing device complexity while maintaining precision
Solution Approach 2:
The system performs corrections based on test exposure data rather than continuous real-time monitoring. By applying correction amounts determined from preliminary measurements, the system achieves sufficient precision without implementing overly complex continuous control mechanisms
3Manufacturing precision
If comprehensive correction calculations are performed for all beam interactions, then manufacturing precision is improved, but loss of time increases due to extensive computation
Solution Approach 1:
The patent performs comprehensive interaction calculations and stores the results in advance during test exposures. During actual production, the control apparatus retrieves pre-calculated correction data, avoiding time-consuming computations during high-speed exposure operations and thus reducing time loss while maintaining precision
Data Source
AI summary
A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.