Beam-Neighboring Electrode Fabrication for Aberration Control
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Solution Overview
Problem
Charged particle beam microscopes suffer from lens aberrations, particularly geometric and chromatic aberrations, which reduce resolution and are exacerbated by mechanical errors in fabrication processes, leading to the need for complex and expensive aberration correctors.
Innovation Solution
The development of charged particle optics components with precisely fabricated electrodes, featuring beam neighboring sections with tight dimensional tolerances and surface roughness, allowing for improved control and reduction of parasitic aberrations without additional multipole elements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional fabrication processes (e.g., spark erosion) are used to manufacture electrode components, then manufacturing cost and ease of fabrication are improved, but mechanical errors and parasitic aberrations increase, worsening manufacturing precision
Solution Approach 1:
The patent replaces conventional mechanical fabrication processes (spark erosion) with direct laser writing technology. This substitution eliminates mechanical contact between the fabrication tool and the electrode material, thereby eliminating mechanical errors and parasitic aberrations that arise from mechanical fabrication processes. The laser writing process directly deposits conductive material to form precise electrode patterns without mechanical tool wear or positioning errors.
Solution Approach 2:
The patent changes the fundamental fabrication parameter from mechanical energy (spark erosion) to optical energy (laser writing). This parameter change enables achievement of sub-micrometer dimensional tolerances (better than 1 μm) while maintaining ease of manufacture. The laser parameters (power, speed, pattern) can be precisely controlled to achieve the desired electrode geometry without the limitations of mechanical fabrication processes.
2Reliability
If additional multipole elements are added to correct parasitic aberrations, then aberration correction performance is improved, but device complexity and cost increase
Solution Approach 1:
The patent extracts and eliminates the source of parasitic aberrations at the fabrication stage, rather than attempting to correct them later with additional multipole elements. By using direct laser writing to manufacture the electrodes with sub-micrometer precision, the parasitic aberrations are prevented from occurring in the first place. This extraction of the problem source simplifies the overall system by removing the need for additional corrective components.
Solution Approach 2:
The patent performs preliminary action by ensuring high manufacturing precision during the electrode fabrication process itself. By establishing tight dimensional tolerances (better than 1 μm) during manufacturing, the parasitic aberrations are prevented before the microscope system is assembled and operated. This preliminary prevention eliminates the need for subsequent corrective measures with additional multipole elements.
3Manufacturing precision
If tighter dimensional tolerances are imposed on beam neighboring sections, then parasitic aberrations are reduced and resolution is improved, but manufacturing difficulty and cost increase
Solution Approach 1:
The patent replaces mechanical fabrication processes with direct laser writing, which inherently achieves sub-micrometer precision without the complexity and cost associated with mechanical methods. The laser writing process uses optical fields to deposit material with precise spatial control, achieving better than 1 μm dimensional tolerance without requiring complex mechanical positioning systems or multiple machining steps.
Solution Approach 2:
The patent changes the fabrication parameter from mechanical tool positioning to optical field control. By using laser parameters (power, scanning speed, focal position) to control material deposition, the system achieves tight dimensional tolerances through software-controlled optical parameters rather than mechanical adjustments. This parameter change makes tight tolerances achievable with standard equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides more precise and reliable performance, reducing parasitic aberrations and enhancing the resolution of charged particle beam systems by minimizing mechanical errors in fabrication.
Implementation Method 1
Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to considerable voltages and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam
Data Source
AI summary
The present invention is directed to an electrode component with at least two electrodes or a multipole component as generally known in the art. Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to high voltages, i.e. more than 10 KV, and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam in a microscope or lithographic apparatus. This neighboring section are positioned in the vicinity or close to a charged particle beam or even facing it. This bears the preferred advantage that high voltages can be generated by the electrodes or to the electrode component and they can withstand those high voltages. This assists in a better guidance and/or controlling of the charged beam, such as for compensating aberration etc. The beam neighboring section can have a surface configured to face the beam. This neighboring section or surface are fabricated with absolute dimensional tolerances less than a desired maximum absolute dimensional tolerance wherein the desired maximum absolute dimensional tolerance is based at least on a maximum voltage to be applied to the electrode. With such a precisely fabricated surface, a more precise and/or efficient field can be generated being able to control the charged particle beam more precisely and efficiently.