Beam Projection Device Variable Exposure Resolution
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Solution Overview
Problem
Miniaturization of beam projection devices in semiconductor manufacturing has reduced the space available for components, making it difficult to enhance the resolution and add or change components effectively.
Innovation Solution
A beam projection device with a beam source, aperture plates, and electrode control circuits that selectively deflect beams using different voltage frequencies to improve resolution, allowing for iterative exposure with 2N-bit resolution without adding components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If beam projection devices are miniaturized to fit semiconductor manufacturing processes, then device size is reduced, but resolution capability deteriorates due to reduced space for components
Solution Approach 1:
The patent applies periodic action by using multiple clock signals with different frequencies to control the electrode control circuits. This enables iterative exposure with varying exposure durations, achieving 2N-bit resolution through time-multiplexed beam deflection control without requiring additional physical components.
Solution Approach 2:
The patent changes the time frequency parameter by using clock signals with different frequencies (first frequency and second frequency) to control voltage application durations to potential electrodes. This parameter variation enables enhanced resolution by creating multiple exposure time intervals, effectively increasing the information capacity within the existing device structure.
2Manufacturing precision
If components are added or changed to improve resolution in miniaturized devices, then resolution capability is improved, but device complexity increases
Solution Approach 1:
The existing electrode control circuits are made multi-functional by controlling them with multiple clock signals of different frequencies. This allows the same physical components to perform iterative exposure with varying resolutions, achieving enhanced functionality without adding new components.
Solution Approach 2:
The system introduces dynamic control by switching between different clock frequencies during operation. The electrode control circuits dynamically adjust voltage application timing based on the active clock signal, enabling flexible resolution adjustment without physical reconfiguration or additional components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the resolution of miniaturized beam projection devices by adjusting voltage frequencies, enabling improved beam projection and patterning capabilities without increasing component count, thus addressing the space constraints.
Implementation Method 1
a blanking aperture plate having an array of blanking apertures therein corresponding to respective apertures of the first array of apertures and configured to selectively deflect second beams passing therethrough responsive to voltages applied to respective potential electrodes of the blanking apertures
Data Source
AI summary
A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.