Beam-Line Pressure Control for Ion Implanter Particle Defects
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Solution Overview
Problem
High current ion implanters face challenges in maintaining low particle defects on substrates during extended operation, leading to increased defect levels over time, which affects productivity and requires frequent downtime for cleaning.
Innovation Solution
Implementing a pressure-control routine in the beam-line ion implanter by introducing a predetermined gas into the downstream portion of the beam-line to reach a specific pressure, followed by evacuation and reestablishment of implantation conditions, which reduces particle contamination and maintains defect levels below acceptable limits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high beam current is used to increase throughput, then productivity is improved, but particle defect levels increase over time
Solution Approach 1:
The patent implements periodic pressure control cycles during ion implantation operation. The system alternates between implantation mode and pressure control mode, where pressure control involves introducing gas to reach a predetermined pressure, holding it, then evacuating. This periodic intervention prevents continuous particle accumulation that would occur under constant high-current operation, thereby maintaining low defect levels while preserving high throughput capability.
2Manufacturing precision
If frequent cleaning is performed to reduce particle contamination, then particle defect levels are improved, but productivity decreases due to downtime
Solution Approach 1:
The patent enables the beam-line to self-clean through automated pressure control cycles that are integrated into the normal operation flow. The system performs pressure control routines (gas introduction, holding, evacuation) without requiring external intervention or shutdown for manual cleaning. This self-service mechanism continuously prevents particle accumulation, maintaining low defect levels while eliminating the productivity loss associated with scheduled cleaning downtime.
3Productivity
If extended operation is maintained to increase productivity, then throughput is improved, but particle defect levels worsen over time
Solution Approach 1:
The patent maintains continuous operation by integrating pressure control cycles within the extended operation timeline rather than shutting down. The system continuously alternates between implantation and pressure control phases, ensuring that particle accumulation is prevented throughout extended operation periods. This allows the beam-line to operate for longer durations at high throughput while maintaining consistently low particle defect levels through ongoing pressure control interventions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The pressure-control routine significantly reduces particle defects by two orders of magnitude, allowing for extended high-throughput operation without the need for immediate shutdown and cleaning, thereby increasing productivity and reducing maintenance frequency.
Implementation Method 1
introducing a predetermined gas to reach a predetermined pressure into at least a downstream portion of the beam-line
Data Source
AI summary
A beamline ion implanter and a method of operating a beamline ion implanter. A method may include performing an ion implantation procedure during a first time period on a first set of substrates, in a process chamber of the ion implanter, and performing a first pressure-control routine during a second time period by: introducing a predetermined gas to reach a predetermined pressure into at least a downstream portion of the beam-line for a second time period. The method may include, after completion of the first pressure-control routine, performing the ion implantation procedure on a second set of substrates during a third time period.