Bipolar High-Voltage Supply for Particle Beam Apparatus
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Solution Overview
Problem
Existing high-voltage supply units for particle beam apparatuses are limited to 1-quadrant operation, restricting them to unipolar voltage supply, which prevents the provision of voltage values in all four quadrants and load current in two directions, affecting the stability and resolution of images in electron and ion beam applications.
Innovation Solution
A high-voltage supply unit with a bipolar voltage supply capability is achieved by using a combination of unipolar first and second current sources, along with a feedback resistor and adjustment/control loop, enabling 4-quadrant operation and reducing power losses through adjustable current sources and a resistor sequence with identical resistors for stable output voltage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a unipolar voltage supply unit is used, then the device structure is simple, but the operational range is limited to one quadrant and cannot provide voltage in all four quadrants
Solution Approach 1:
The patent combines a first unipolar voltage supply unit and a second unipolar voltage supply unit into a single bipolar voltage supply unit. The first current source and second current source are merged through a common output node, allowing the system to deliver current in both positive and negative directions while maintaining a unified structural framework.
Solution Approach 2:
The bipolar voltage supply unit is designed to perform multiple functions: it can operate in four quadrants (providing both positive and negative voltages and currents), it can function as either a voltage source or current source depending on configuration, and it can supply power to different types of particle beam apparatus (electron beam and ion beam). This multi-functionality resolves the contradiction by enabling wide operational range without proportionally increasing complexity.
2Adaptability or versatility
If a bipolar voltage supply unit with multiple current sources is used, then the operational range covers all four quadrants, but the device complexity increases
Solution Approach 1:
The bipolar voltage supply unit is segmented into distinct functional modules: a first unipolar voltage supply unit (with first voltage source and first current source), a second unipolar voltage supply unit (with second voltage source and second current source), and a control unit. Each module handles specific tasks, and they are combined through a common output node. This segmentation allows complex bipolar operation to be achieved through coordinated simple modules.
Solution Approach 2:
The control unit receives feedback signals from the output node and adjusts the operation of the first and second current sources accordingly. This feedback mechanism enables the system to maintain stable output voltage or current across all four quadrants while automatically managing the complexity of coordinating multiple current sources. The feedback loop ensures that the combined system operates as a unified whole rather than as separate conflicting components.
3Manufacturing precision
If fixed current sources are used, then the device structure is simple, but the image resolution and stability are affected due to inability to adjust voltage values
Solution Approach 1:
The patent implements dynamic adjustability in the first and second current sources, allowing their output values to be varied in real-time based on operational requirements. The control unit dynamically adjusts the current source parameters to maintain optimal image resolution and stability across different operating conditions (all four quadrants). This dynamic capability transforms the system from a static fixed-value design to an adaptive design that maintains precision regardless of the quadrant of operation.
4Manufacturing precision
If a high-voltage supply unit with adjustable current sources and feedback control is used, then image resolution and stability improve, but the device complexity increases
Solution Approach 1:
The control unit implements feedback control by continuously monitoring the output voltage and current at the common output node and adjusting the first and second current sources to maintain desired operating parameters. This feedback mechanism ensures image stability and resolution by compensating for any deviations in real-time, while the modular architecture keeps the control system manageable rather than overly complex.
Data Source
AI summary
The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.