Block Copolymer Mask for Pixel Defining Layer Grooves
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Solution Overview
Problem
Existing display technologies face challenges in achieving high display quality, particularly in forming fine structures like pixel defining layers with grooves that are similar in size to molecules, which is difficult with conventional photolithography processes.
Innovation Solution
The method involves forming a block copolymer layer on a substrate, patterning it to create a self-assembly structure, and using this pattern as a mask to etch the pixel defining layer, resulting in an uneven pixel defining layer with grooves that are spaced at a predetermined interval, allowing for improved light emission and reduced color change with viewing angle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography processes are used to form pixel defining layers, then the manufacturing process is relatively simple, but it is difficult to form fine structures with groove sizes similar to molecules
Solution Approach 1:
The block copolymer layer performs self-assembly to automatically form the desired pattern structure without requiring complex external patterning steps. The molecules self-organize into domains with sizes similar to molecules, achieving fine structure formation through their own intrinsic properties rather than external manipulation
Solution Approach 2:
The invention changes the physical and chemical parameters of the pixel defining layer by incorporating block copolymers with specific molecular structures. By controlling the block copolymer composition and self-assembly conditions, the groove size and morphology can be precisely tuned to molecular-scale dimensions
2Measurement precision
If photolithography is used for patterning, then the process is well-established, but it cannot achieve the required fine structure resolution for high display quality
Solution Approach 1:
The invention replaces the mechanical photolithography patterning system with a self-assembly system based on block copolymer molecular organization. Instead of using light exposure and chemical etching to define patterns, the system uses the spontaneous self-organization of block copolymer molecules to directly form the desired groove patterns with molecular-scale resolution
Solution Approach 2:
The invention transitions from two-dimensional planar patterning to three-dimensional self-assembled structures. The block copolymer forms vertical domains and grooves that extend through the pixel defining layer, creating a three-dimensional patterned structure that provides both high resolution and functional depth
3Productivity
If smooth pixel defining layers are used, then the fabrication is simpler, but light extraction efficiency is reduced and color change with viewing angle increases
Solution Approach 1:
The block copolymer creates local variations in the pixel defining layer structure, forming grooves and domains with specific properties in different regions. These local structural differences enhance light extraction at specific locations and angles while maintaining the overall integrity of the pixel defining layer
Solution Approach 2:
The self-assembly process creates curved and three-dimensional groove structures rather than flat planar surfaces. These curved structures, including vertical and inclined walls, improve light extraction efficiency by reducing total internal reflection and enhancing light scattering, while also improving viewing angle characteristics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of fine pixel defining layer grooves similar in size to molecules, enhancing light extraction efficiency and reducing color change due to viewing angle, thereby improving display quality.
Implementation Method 1
providing ozone, oxygen plasma, and UV... rearranging the first repeating units and the second repeating units to form a self-assembly structure
Implementation Method 2
providing ozone, oxygen plasma, and UV... removing the first repeating units to form the block copolymer pattern
Implementation Method 3
etching the pixel defining layer by using the patterned block copolymer layer as a mask, such that an uneven pixel defining layer with a plurality of defining layer grooves is formed
Data Source
AI summary
A method for fabricating a display device includes forming a thin film transistor on a base substrate, forming a first electrode connected to the thin film transistor, forming a pixel defining layer overlapping a portion of the first electrode, such that the pixel defining layer exposes a portion of the first electrode and partitions pixel areas, forming a block copolymer layer on the first electrode and the pixel defining layer, patterning the block copolymer layer, etching the pixel defining layer by using the patterned block copolymer layer as a mask, such that an uneven pixel defining layer with a plurality of defining layer grooves is formed, and forming a light emitting layer on the first electrode and the uneven pixel defining layer.