Branched Fluorinated Photopolymers for Organic Electronics Patterning

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Solution Overview

Problem

Current photopolymer systems for organic and bioelectronic devices face challenges with low development and stripping rates in fluorinated solvents, leading to decreased manufacturing throughput and potential material degradation due to prolonged exposure.

Innovation Solution

A fluorinated photopolymer composition comprising a branched copolymer with a branching unit, a fluorine-containing group, and a solubility-altering reactive group, used in conjunction with fluorinated solvents for improved development and stripping processes, enhancing sensitivity and compatibility with organic materials.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional photolithographic solvents and processes are used for patterning organic electronic materials, then fine pattern resolutions can be achieved, but the organic materials are degraded due to solvent resistance

Engineering Contradiction:
Improvepattern resolutionVSAvoidmaterial degradation
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent changes the chemical parameters of the solvent system by using fluorinated solvents with specific fluorine content (e.g., CF3 groups) and adjusted polarity, which fundamentally alters the solvent-material interaction to prevent degradation while maintaining patterning capability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs composite photopolymer formulations combining fluorinated solvents with specific photoinitiators and polymer matrices that are chemically compatible with organic electronic materials, creating a synergistic system that achieves both fine patterning and material protection

Inventive Principle:
Principle #40Composite materials

2Object-affected harmful factors

If fluorinated solvents are used for development and stripping, then compatibility with organic materials is improved, but development and stripping rates are reduced

Engineering Contradiction:
Improvematerial compatibilityVSAvoiddevelopment and stripping rates
Core Design Contradiction:
Object-affected harmful factorsVSProductivity

Solution Approach 1:

The patent applies local quality by using fluorinated solvents with specific regional fluorine distribution (e.g., CF3 groups at particular positions in the molecular structure) that provide enhanced material compatibility in contact zones while maintaining adequate dissolution kinetics

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent optimizes physical parameters of the fluorinated solvent system including temperature, solvent-to-substrate ratio, and exposure time to compensate for reduced reaction rates, thereby maintaining productivity despite slower development and stripping kinetics

Inventive Principle:
Principle #35Parameter changes

3Object-affected harmful factors

If longer developing and stripping times are used to improve material compatibility, then material degradation is reduced, but manufacturing throughput decreases

Engineering Contradiction:
Improvematerial degradationVSAvoidmanufacturing throughput
Core Design Contradiction:
Object-affected harmful factorsVSLoss of time

Solution Approach 1:

The patent applies preliminary action by pre-treating the organic electronic materials with protective coatings or surface modifications before photolithography, which prevents degradation during extended processing times without requiring actual time extension

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes process parameters such as increasing fluorinated solvent temperature or adjusting photopolymer composition to accelerate development and stripping kinetics, thereby reducing processing time while maintaining material compatibility

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution improves development and stripping rates, maintains material integrity, and increases manufacturing efficiency while maintaining compatibility with organic electronic materials.

Implementation Method 1

exposing the photopolymer layer to patterned radiation to form an exposed photopolymer layer

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Implementation Method 2

contacting the exposed photopolymer layer with a developing agent to remove a portion of the exposed photopolymer layer in accordance with the patterned light

Methodology Applied
Scientific EffectDissolution: Solvation

Data Source

PatentUS10078262B2Patterning devices using branched fluorinated photopolymers
Publication Date: 2018.09.18 ORTHOGONAL
  • US10078262B2 patent drawing
  • US10078262B2 patent drawing
  • US10078262B2 patent drawing

AI summary

A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.