Bubble Pipe Layout in Substrate Treatment Chambers for Uniform Immersion
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Solution Overview
Problem
Conventional substrate treatment apparatuses with reduced treatment fluid capacity face challenges in uniformly supplying bubbles to substrates due to restricted bubbler arrangement, leading to non-uniform surface treatment and impaired in-plane uniformity.
Innovation Solution
The substrate treatment apparatus features a punching plate with a recess and tubular bubble supply pipes disposed inside the recess, allowing for uniform bubble distribution across the substrate surface while minimizing interference with the lifter, and uses fluorocarbon polymer pipes supported above the punching plate to prevent warping and ensure straightness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If the treatment chamber capacity is reduced to save treatment fluid, then the amount of treatment fluid is reduced, but the arrangement of bubble supply pipes is restricted and in-plane uniformity deteriorates
Solution Approach 1:
The punching plate introduces a vertical dimension solution by creating a recess that allows bubble supply pipes to be positioned at different heights. This vertical arrangement enables uniform bubble distribution across the substrate surface without requiring horizontal space, thus resolving the contradiction between reduced chamber capacity and maintained in-plane uniformity.
Solution Approach 2:
The bubble supply system is segmented into multiple pipes positioned at different locations and heights within the treatment chamber. The punching plate recess accommodates specific pipes (e.g., central pipes) at lower positions while other pipes remain higher, creating a segmented vertical arrangement that ensures comprehensive and uniform bubble coverage despite the reduced chamber volume.
2Manufacturing precision
If bubble supply pipes are arranged in the movable range of the lifter, then bubble supply coverage is improved, but interference with the lifter occurs and in-plane uniformity deteriorates
Solution Approach 1:
The punching plate recess creates a vertical niche that allows certain bubble supply pipes to be positioned below the lifter's movable path. This vertical dimension solution enables the pipes to supply bubbles uniformly to the substrate without occupying the horizontal space needed for lifter movement, thus eliminating interference while maintaining in-plane uniformity.
Solution Approach 2:
The bubble supply pipes are nested within the recess structure of the punching plate, which itself is integrated into the treatment chamber floor. This nested arrangement allows the pipes to be concealed within the chamber structure, clearing the horizontal movement path for the lifter while maintaining optimal bubble supply positioning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables uniform bubble supply to the substrate surface, enhancing the in-plane uniformity of surface treatment and preventing interference between bubble supply pipes and the lifter, thus improving the efficiency and consistency of substrate treatment processes.
Implementation Method 1
the punching plate forming a laminar flow of the treatment fluid supplied from the treatment fluid supplying part
Implementation Method 2
a plurality of tubular bubble supply pipes disposed above the punching plate inside the treatment chamber, the bubble supply pipes supplying, from below the substrate held by the lifter, bubbles in the treatment fluid stored in the treatment chamber
Data Source
AI summary
An upward laminar flow of a treatment fluid is formed inside a treatment chamber. Substrates are immersed in the treatment fluid. Eight bubble supply pipes are disposed inside the treatment chamber, and supply bubbles in the treatment fluid from below the substrates. Two innermost bubble supply pipes out of the eight bubble supply pipes are disposed inside a recess of a punching plate so that the two bubble supply pipes are lower than the other bubble supply pipes. Even when a lifter lowers the substrates to an immersion position, an extremity of a back plate is prevented from hitting the two bubble supply pipes. Furthermore, the eight bubble supply pipes including the two innermost bubble supply pipes can uniformly supply bubbles to the surface of the substrates.