Buffer Chamber for Consumable Replacement in Substrate Processing
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Solution Overview
Problem
Existing substrate processing apparatuses require frequent shutdowns and lengthy process environment re-creation to replace consumables like shower heads and focus rings, leading to inefficiencies in plasma processing due to contamination and wear.
Innovation Solution
A substrate processing apparatus with a lifting member, door means, and transport mechanism that allows for the replacement of consumables like shower heads and focus rings while maintaining the chamber processing environment, using a buffer chamber to store and transport these components without disrupting the internal environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If consumables (shower head, focus ring) are replaced by stopping the substrate treatment process and opening the process chamber, then the consumables can be replaced, but the chamber processing environment must be re-created which takes a lot of time
Solution Approach 1:
The system is divided into two separate chambers: a process chamber for substrate treatment and a buffer chamber for consumable storage and replacement. This segmentation allows consumable replacement to occur in the buffer chamber without affecting the process chamber environment, thereby eliminating the time required to re-create the chamber processing environment.
Solution Approach 2:
A door means with a passage acts as an intermediary between the process chamber and buffer chamber. This intermediary mechanism enables the transfer of consumables between chambers while maintaining environmental isolation, allowing replacement operations in the buffer chamber to proceed without disrupting the process chamber's processing environment.
2Ease of repair
If the substrate treatment process is stopped to replace consumables, then consumable replacement can be performed, but productivity decreases due to process interruption
Solution Approach 1:
By segmenting the system into a process chamber for continuous substrate treatment and a buffer chamber for consumable replacement operations, the patent enables maintenance activities to proceed independently without interrupting the main production process, thereby maintaining high productivity.
Solution Approach 2:
The process chamber continues its substrate treatment operations uninterrupted while the buffer chamber performs consumable replacement. This continuity of useful action in the process chamber ensures that productivity is maintained despite ongoing maintenance activities in the buffer chamber.
3Ease of repair
If a door means is opened to access the process chamber for consumable replacement, then consumables can be replaced, but the chamber processing environment is disrupted
Solution Approach 1:
The patent separates the consumable storage and replacement functions into a distinct buffer chamber, eliminating the need to open the process chamber door for consumable replacement. This segmentation protects the process chamber environment from disruption while still enabling easy consumable replacement in the buffer chamber.
Solution Approach 2:
The door means with a passage serves as an intermediary that allows consumable transfer between chambers without requiring the process chamber door to be fully opened. This intermediary mechanism maintains the sealed environment of the process chamber while enabling consumable replacement operations in the buffer chamber.
Data Source
AI summary
Proposed is a substrate processing apparatus capable of replacing consumables and, more particularly, to a technique for supporting replacement of consumables such as a shower head and a focus ring while maintaining a chamber processing environment of the substrate processing apparatus.