Calix Resorcinarene Resist Composition for Fine Patterning
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Solution Overview
Problem
The calix resorcinarene compound used in chemically amplified resist compositions has low sensitivity and resolution due to its high solubility in alkaline developers, leading to unstable pattern formation and reduced processing accuracy in fine patterning applications.
Innovation Solution
Incorporating a calix resorcinarene derivative with a specific structure, including non-acid-decomposable groups and hydrophobic substituents, into a negative-working resist composition, along with an acid generator and cross-linking agent, to reduce solubility in alkaline developers and enhance pattern resolution and sensitivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a calix resorcinarene compound is used in chemically amplified resist composition, then the composition has high sensitivity, but the compound has high solubility in alkaline developers which reduces pattern resolution and sensitivity
Solution Approach 1:
The patent modifies the calix resorcinarene compound by changing its chemical parameters - specifically introducing non-acid-decomposable groups and hydrophobic substituents. This alters the compound's solubility characteristics in alkaline developers while preserving its chemically amplified sensitivity, thereby resolving the contradiction between high sensitivity and good pattern resolution
Solution Approach 2:
The patent creates a composite structure by combining the calix resorcinarene core with specific functional groups (non-acid-decomposable groups and hydrophobic substituents). This composite approach allows the material to exhibit both high sensitivity (from the chemically amplified core) and low solubility in alkaline developers (from the hydrophobic substituents), thus achieving both high reliability and manufacturing precision
2Ease of manufacture
If conventional polymer material with high molecular weight is used, then the material has good solubility and processability, but it has broad molecular weight distribution which limits processing size and accuracy
Solution Approach 1:
The patent changes the molecular weight parameter from high (conventional polymer) to low (calix resorcinarene derivative). This parameter change results in a narrow molecular weight distribution, which improves processing size and accuracy while maintaining adequate solubility and processability through the compound's structural design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The optimized calix resorcinarene derivative composition achieves high sensitivity and well-shaped patterns with no decrease in resolution, improving the stability and accuracy of fine patterning processes.
Implementation Method 1
a negative-working, chemically amplified photosensitive composition contains an alkali-soluble resin, an acid generator component which generates acid when exposed to light
Implementation Method 2
the resin is cross-linked to the cross-linking agent by the action of an acid that is generated from the acid generator component by exposure to light
Data Source
AI summary
This disclosure provides a negative-working resist composition comprising a calix resorcinarene derivative (A) of specific structure, an acid generator (B) which directly or indirectly generates an acid when exposed to an active energy ray having a wavelength of 248 nm or less, and a cross-linking agent (C).