Capacitive Touch Screen Electrode Segmentation for Sputtering Time Reduction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing electrostatic capacity type touch screen panels face challenges in reducing sputtering and etching times for forming transparent conductive layers, leading to increased process yield issues and residual film formation during electrode pattern formation.
Innovation Solution
The touch screen panel design involves forming first and second electrode patterns with distinct thicknesses, where the upper layers are thicker than the lower layers, and using a method that separates the deposition and patterning processes for these layers to reduce overall processing time and prevent residual films, while maintaining electrical insulation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the transparent conductive layer is formed with sufficient thickness to satisfy surface resistance conditions, then the electrical performance is improved, but the sputtering time and etching time increase
Solution Approach 1:
The transparent conductive layer is divided into multiple patterns (first electrode patterns, second electrode patterns, connection patterns) that are formed in separate sputtering and etching processes. By segmenting the formation process, each pattern can be optimized independently, reducing the total processing time while maintaining sufficient thickness for electrical performance.
Solution Approach 2:
The insulation layer is formed in advance before the transparent conductive patterns are created. This preliminary action allows the subsequent sputtering and etching processes to work on pre-defined areas, reducing the time required for each step while ensuring proper thickness for electrical performance.
2Productivity
If the sputtering and etching processes are performed quickly to reduce processing time, then productivity is improved, but residual films remain during pattern formation
Solution Approach 1:
The pattern formation is segmented into multiple discrete sputtering and etching steps, each targeting specific patterns (first electrode patterns, second electrode patterns, connection patterns). This segmentation allows each step to be optimized for complete removal without residual films, while the overall process remains efficient through parallel processing planning.
Solution Approach 2:
The sputtering and etching processes are designed to perform partial actions in sequence, where each step removes material slightly beyond the desired pattern boundaries, ensuring complete removal of residual films. The insulation layer and multi-pattern approach provide buffers that allow excessive removal in one step to be corrected in subsequent steps.
3Adaptability or versatility
If the electrode patterns are formed with complex multi-layer structures to improve functionality, then the touch screen performance is enhanced, but the manufacturing process complexity increases
Solution Approach 1:
The complex electrode structure is segmented into first electrode patterns, second electrode patterns, and connection patterns, each formed in separate sputtering and etching processes. This segmentation transforms a single complex manufacturing step into multiple simpler, standardized steps that can be systematically repeated and controlled.
Solution Approach 2:
The insulation layer is formed as a preliminary structure before the electrode patterns are created. This preliminary insulation layer simplifies subsequent manufacturing steps by providing a defined boundary that guides the formation of complex multi-layer electrode structures, reducing the overall process complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the sputtering and etching times, enhances process yield, and allows for pattern formation without residual films, improving the manufacturing efficiency of electrostatic capacity type touch screen panels.
Implementation Method 1
reducing sputtering and etching times for forming transparent conductive layers
Implementation Method 2
reducing sputtering and etching times for forming transparent conductive layers
Data Source
AI summary
A touch screen panel is disclosed. The touch screen panel includes a substrate; a plurality of first electrode serials arranged on the substrate; a plurality of second electrode serials arranged to cross over the first electrode serials; and an insulation layer formed at the intersections of the first and second electrode serials and to electrically insulate the first and second electrode serials, wherein each of the first electrode serials comprises a plurality of first electrode patterns and second connection patterns for connecting neighboring first electrode patterns, each of the second electrode serials comprises a plurality of second electrode patterns and first connection patterns for connecting neighboring second electrode patterns, and each of the first electrode patterns comprises a lower layer formed on the substrate and an upper layer formed on the lower layer, and the second connection pattern connects neighboring first electrode pattern upper layers.