Capacitor Dielectric Conditioning for Higher Capacitance
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Solution Overview
Problem
As semiconductor devices become highly integrated, the capacitance of capacitors decreases due to reduced area, and existing methods to increase capacitance by reducing dielectric layer thickness or increasing dielectric constant are limited in effectiveness without damaging the layer or increasing leakage current.
Innovation Solution
A method of fabricating a capacitor by forming electrodes and a dielectric layer, and applying a voltage or current outside the operating range in the form of a sweep or pulse to increase the dielectric constant and capacitance, while maintaining the thickness of the dielectric layer to avoid leakage current issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the area of the capacitor is reduced to achieve high integration, then the device density is improved, but the capacitance decreases
Solution Approach 1:
The patent applies parameter changes by subjecting the dielectric layer to high voltage or high current outside the operating range, which modifies the physical or chemical parameters of the dielectric material. This treatment increases the dielectric constant of the layer, thereby increasing capacitance without changing the capacitor area, resolving the contradiction between high integration density and sufficient capacitance.
2Quantity of substance
If the thickness of the dielectric layer is reduced to increase capacitance, then the capacitance is improved, but the leakage current increases
Solution Approach 1:
Instead of reducing thickness, the patent changes the dielectric parameter by applying high voltage or high current treatment to increase the dielectric constant. This approach increases capacitance while maintaining the same dielectric layer thickness, thereby avoiding the increase in leakage current that would result from thinning the layer.
Solution Approach 2:
The patent applies excessive action by using voltage or current that exceeds the normal operating range during the dielectric layer treatment. This excessive electrical stimulus modifies the dielectric properties of the layer, increasing its constant and thus the capacitance, without requiring the layer to be thinner and without causing harmful leakage during normal operation.
3Quantity of substance
If the dielectric constant of the dielectric layer is increased to increase capacitance, then the capacitance is improved, but the manufacturing complexity increases
Solution Approach 1:
The patent changes the dielectric parameter through electrical treatment (high voltage or high current application) rather than through material substitution or complex multi-layer structures. This approach increases the dielectric constant using a relatively simple process step added to the existing manufacturing flow, minimizing the increase in manufacturing complexity while achieving the desired capacitance increase.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively increases capacitance by up to 10% without significantly increasing leakage current, maintaining the dielectric layer's integrity and preventing unwanted leakage, thus enhancing the performance of semiconductor devices.
Implementation Method 1
applying, between the first electrode and the second electrode, a voltage outside an operating voltage range applied during operation or a current outside an operating current range applied during operation... the applying... increases a capacitance of the capacitor
Data Source
AI summary
Provided is a method of fabricating a capacitor. The method of fabricating a capacitor may include forming a first electrode, forming a dielectric layer on the first electrode, forming a second electrode on the dielectric layer, and applying, between the first electrode and the second electrode, a voltage outside an operating voltage range applied during operation or a current outside an operating current range applied during operation.


