Catalyst Coil Layout for High-Concentration Radical Supply
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Solution Overview
Problem
Existing radical supply apparatuses in semiconductor device manufacturing struggle to achieve high concentrations of radicals for efficient substrate processing.
Innovation Solution
The apparatus includes a housing with a radical generation space and a power supply space separated by a partition member, a power supply coil connected to a high-frequency power supply, a processing gas supply mechanism, a catalyst coil acting as a metal catalyst when heated, and a catalyst placing table with a regulation member to maintain the catalyst coil's position.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a catalyst heat generating member is used to generate radicals by contacting processing gas with the heated catalyst, then radicals can be generated for substrate processing, but the radical concentration is insufficient for efficient processing
Solution Approach 1:
The patent combines two radical generation methods: catalytic action from the heated catalyst coil and plasma generation from the electromagnetic wave irradiation. This merging of thermal catalysis and plasma excitation creates a synergistic effect that dramatically increases radical concentration compared to using either method alone, thereby improving processing efficiency
Solution Approach 2:
The patent changes the physical state and energy parameters of the processing gas by subjecting it to both high temperature from the catalyst coil and high-energy electromagnetic wave irradiation. This dual parameter change (temperature and energy input) transforms the gas into a high-concentration radical source, resolving the contradiction between radical quantity and processing efficiency
2Temperature
If the catalyst coil is heated by non-contact power supply from the power supply coil, then the catalyst coil can generate radicals when processing gas contacts it, but thermal expansion causes displacement from the optimal position facing the power supply coil
Solution Approach 1:
The patent anticipates and compensates for thermal expansion by providing clearance space between the catalyst coil and the partition member. This clearance allows the catalyst coil to expand radially when heated without causing displacement or contact with surrounding structures, maintaining position stability despite temperature increases
Solution Approach 2:
The patent incorporates a cushioning mechanism by designing the mounting structure with sufficient clearance and flexibility. This beforehand cushioning prevents the catalyst coil from displacing due to thermal expansion, ensuring reliable positioning throughout the heating cycle without requiring active control systems
3Reliability
If the catalyst coil is constrained to prevent displacement from thermal expansion, then position stability is maintained, but the coil cannot accommodate thermal expansion and may suffer from stress or deformation
Solution Approach 1:
The patent designs the catalyst coil mounting with radial clearance that specifically accommodates thermal expansion in the radial direction. This allows the coil to expand freely without generating stress, while the axial position remains stable due to the constraint provided by the partition member and mounting structure. The asymmetric constraint approach maintains both position stability and structural integrity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively generates and supplies high-concentration radicals to the substrate processing space, enhancing the efficiency of film formation and other processing tasks in semiconductor manufacturing.
Implementation Method 1
a power supply coil provided in the power supply space, one end of which is connected to a high-frequency power supply and the other end of which is grounded or grounded via a capacitor
Implementation Method 2
a partition member configured to transmit electromagnetic waves
Implementation Method 3
a catalyst coil that is disposed in the radical generation space at a position facing the power supply coil and configured to act as a metal catalyst when heated by non-contact power supply from the power supply coil
Implementation Method 4
radicals of the processing gas are generated by contacting the processing gas with the heated catalyst coil
Data Source
AI summary
A radical supply apparatus for supplying radicals of a processing gas for processing a substrate comprises a housing divided into a radical generation space and a power supply space, a power supply coil provided in the power supply space, a catalyst coil that is disposed in the radical generation space at a position facing the power supply coil and configured to act as a metal catalyst when heated by non-contact power supply from the power supply coil, and a catalyst placing table disposed in the radical generation space, on which the catalyst coil is placed, and having a regulation member configured to regulate displacement of the catalyst coil, which is thermally expanded by heating, from the position facing the power supply coil. The radicals of the processing gas are generated by contacting the processing gas with the heated catalyst coil, and are supplied to a space for processing the substrate.