Ceramic Filter Membrane Coating for Uniform Particle Filtration

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Solution Overview

Problem

Existing filter membranes used in semiconductor manufacturing often have random pore sizes and shapes, leading to inefficiencies in removing contaminants and particles, which can result in defects and reduced yield in integrated circuit production.

Innovation Solution

A filter membrane made of ceramic materials like aluminum oxide with substantially uniform pore sizes, ranging from 10 nm to 500 nm, and a coating material for improved acid and alkali resistance, designed to enhance particle capture and flow conductivity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If existing filter membranes with random pore sizes are used, then the device complexity is reduced, but the manufacturing precision and particle removal efficiency deteriorate

Engineering Contradiction:
Improvepore size uniformityVSAvoidfilter membrane structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent employs a porous filter membrane with controlled pore sizes ranging from 10 nm to 500 nm to achieve effective particle removal while maintaining manageable device complexity. The porous structure enables precise filtration without requiring overly complex membrane designs.

Inventive Principle:
Principle #31Porous materials

Solution Approach 2:

The patent optimizes the pore size parameter within a specific range (10 nm to 500 nm) to balance particle capture efficiency with flow conductivity. By controlling this critical parameter, the filter achieves high manufacturing precision while avoiding excessive structural complexity.

Inventive Principle:
Principle #35Parameter changes

2Ease of operation

If acidic or alkaline solutions are used for cleaning, then the ease of operation is improved, but the reliability of the filter membrane deteriorates due to degradation

Engineering Contradiction:
Improvecleaning processVSAvoidfilter membrane stability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The patent uses a composite structure combining a base membrane material with a coating material that provides enhanced chemical resistance. This composite approach allows the filter to withstand acidic and alkaline cleaning solutions without degradation, maintaining reliability while improving ease of operation.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent applies a coating material specifically on the surface of the base membrane to provide localized chemical resistance. This local quality enhancement protects the filter membrane from acid and alkali damage during cleaning operations while preserving the overall filter structure.

Inventive Principle:
Principle #3Local quality

3Manufacturing precision

If smaller pore sizes are used to capture smaller particles, then the purity is improved, but the fluid flow is reduced

Engineering Contradiction:
Improveparticle capture capabilityVSAvoidliquid flow rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent optimizes the pore size parameter within a range (10 nm to 500 nm) rather than using a single fixed size, allowing the filter to capture small particles effectively while maintaining sufficient flow conductivity for productive operation.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The uniform pore size filter membrane effectively captures particles as small as 0.1 micrometer, improving the yield of integrated circuits by reducing defects and allowing for the use of acidic or alkaline solutions without degradation.

Implementation Method 1

Filters, in particular, point-of-use (POU) filters, are designed to remove contaminants or particles from the liquids, solutions, and/or solvents used in semiconductor integrated circuit manufacturing processes

Methodology Applied
Scientific EffectPhysical filtration: Filter (physical)

Data Source

PatentUS12251786B2Filter apparatus for semiconductor device fabrication process
Publication Date: 2025.03.18 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12251786B2 patent drawing
  • US12251786B2 patent drawing
  • US12251786B2 patent drawing

AI summary

A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane made of a ceramic material, and a plurality of through holes. The base membrane is coated with a coating material.