Ceramic Stage RF Electrode Edge Plasma Control
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Solution Overview
Problem
Existing plasma processing technologies face challenges in selectively generating plasma near the edge of a substrate for efficient etching or film formation, often resulting in unwanted plasma generation on other regions of the substrate.
Innovation Solution
A stage with a ceramics-based body embedding a radio-frequency electrode that extends below the substrate's placement surface, combined with specific dimensions and configurations of transmission lines, gas supply positions, and insulating members, allows for controlled plasma generation only near the substrate's edge by concentrating the electric field and gas flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a radio-frequency electrode is used to generate plasma on the substrate, then plasma processing can be performed, but plasma is generated on regions other than the edge where it is not needed
Solution Approach 1:
The patent applies local quality by making the radio-frequency electrode extend only in specific regions (first region and second region) rather than uniformly across the entire substrate. The electrode has different configurations in different areas: it extends toward the edge in the first region and has reduced extension or different orientation in the second region, creating localized electric fields that generate plasma only where needed at the substrate edge while avoiding unwanted plasma generation in other areas.
2Productivity
If the radio-frequency electrode extends toward the edge of the substrate, then plasma can be generated near the edge for effective processing, but the electrode becomes exposed to plasma which may cause damage
Solution Approach 1:
The patent resolves the contradiction by transitioning from a two-dimensional planar electrode configuration to a three-dimensional structure where the radio-frequency electrode extends vertically from the substrate surface toward the edge. This dimensional change allows the electrode to generate plasma effectively at the edge while the insulating substrate body provides protection from direct plasma exposure, maintaining both processing efficiency and electrode durability.
3Productivity
If the radio-frequency electrode is positioned to concentrate electric field at the edge, then plasma generation is improved, but the electrode configuration becomes complex
Solution Approach 1:
The patent applies segmentation by dividing the radio-frequency electrode into multiple distinct regions (first region and second region) with different configurations. The electrode is segmented such that the first region extends toward the substrate edge to concentrate electric field for plasma generation, while the second region has reduced extension or different orientation to avoid unwanted plasma. This segmented approach achieves effective plasma generation with a relatively simple integrated electrode structure rather than requiring multiple separate electrodes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables efficient plasma generation and processing of the substrate's edge without exposing other areas, effectively removing deposits or forming films, while protecting the radio-frequency electrode from plasma exposure.
Implementation Method 1
a radio-frequency electrode is embedded. The stage body is made of ceramics, and the radio-frequency electrode extends in a direction of the thickness in a region below an outer periphery of the placement surface
Data Source
AI summary
A stage includes a stage body having a placement surface and a radio-frequency electrode embedded in the stage body. The stage body is made of ceramics, and the radio-frequency electrode extends in a thickness direction of the stage body in a region below an outer periphery of the placement surface.


